Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.54 |
| ▸ | ACP1 | P24666 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 4/20 | 0.45 |
| ▸ | CA1 | P00915 | 2/20 | 0.44 |
| ▸ | CA2 | P00918 | 2/20 | 0.44 |
| ▸ | MMP1 | P03956 | 1/20 | 0.44 |
| ▸ | MMP2 | P08253 | 1/20 | 0.44 |
| ▸ | MMP9 | P14780 | 1/20 | 0.44 |
| ▸ | MMP8 | P22894 | 1/20 | 0.44 |
| ▸ | MMP13 | P45452 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | CNR1 | P21554 | 2/20 | 0.42 |
| ▸ | LCK | P06239 | 1/20 | 0.41 |
| ▸ | FYN | P06241 | 1/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9617536 | 0.98 | CES2 (0.52) | CES2ACP1MAPTCA1CA2 | |
| SCHEMBL21522543 | 0.98 | CES2 (0.52) | CES2ACP1MAPTCA1CA2 | |
| SCHEMBL21522570 | 0.98 | CES2 (0.52) | CES2ACP1MAPTCA1CA2 | |
| SCHEMBL21522647 | 0.98 | CES2 (0.52) | CES2ACP1MAPTCA1CA2 | |
| Trimethylammonium SCHEMBL4385863 | 0.92 | CES2 (0.47) | CES2ACP1MAPTCA1CA2 | |
| Tetramethylammonium Ion SCHEMBL5493903 | 0.92 | CES2 (0.47) | CES2ACP1MAPTCA1CA2 | |
| SCHEMBL3182026 | 0.87 | CES2 (0.42) | CES2ACP1MAPTCA1CA2 | |
| SCHEMBL11292063 | 0.86 | ACP1 (0.49) | CES2ACP1MAPTCA1CA2 | |
| SCHEMBL2758458 | 0.86 | CES2 (0.41) | CES2ACP1MAPTCA1CA2 | |
| SCHEMBL13277683 | 0.84 | ACP1 (0.48) | CES2ACP1MAPTCA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1733 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119153690-A | Secondary battery, negative electrode plate and electricity utilization device | 宁德时代新能源科技股份有限公司 | 2024-12-17 | — | — | CN | claimed |
| CN-114188583-A | Composite proton exchange membrane and preparation method and application thereof | 中汽创智科技有限公司 | 2022-03-15 | — | — | CN | claimed |
| CN-102584651-B | Reduction method of sulfoacid | UNIV ZHEJIANG | 2013-12-18 | — | — | CN | claimed |
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | claimed |
| CN-100339767-C | Resist compositions | WAKO PURE CHEM IND LTD (JP) | 2007-09-26 | — | — | CN | claimed |
| US-6949329-B2 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-09-27 | — | — | US | claimed |
| CN-1633628-A | Resist compositions | WAKO PURE CHEM IND LTD (JP) | 2005-06-29 | — | — | CN | claimed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | claimed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | claimed |
| US-20030017425-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2003-01-23 | — | — | US | claimed |
| US-12619152-B2 | Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for producing electronic device, and method for producing onium salt | FUJIFILM CORPORATION (JP) | 2026-05-05 | — | — | US | disclosed |
| US-12578648-B2 | Rinsing liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2026-03-17 | — | — | US | disclosed |
| US-12554196-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound | FUJIFILM CORPORATION (JP) | 2026-02-17 | — | — | US | disclosed |
| US-12517431-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive composition, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2026-01-06 | — | — | US | disclosed |
| US-20260003270-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJFILM CORP (JP) | 2026-01-01 | — | — | US | disclosed |
| WO-2002019033-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-07 | — | — | WO | disclosed |
| US-20010038970-A1 | Photoresist compositions comprising blends of photoacid generators | SHIPLEY COMPANY, L.L.C. (US) | 2001-11-08 | — | — | US | disclosed |
| US-6203965-B1 | USEFUL AS DEEP ULTRAVIOLET RADIATION PHOTORESISTS | SHIPLEY COMPANY, L.L.C. | 2001-03-20 | — | — | US | disclosed |
| US-6200728-B1 | Photoresist compositions comprising blends of photoacid generators | SHIPLEY COMPANY, L.L.C. | 2001-03-13 | — | — | US | disclosed |
| EP-1030221-A1 | Photoresist compositions comprising blends of photoacid generators | Shipley Company LLC (US) | 2000-08-23 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12619152-B2 | Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for producing electronic device, and method for producing onium salt | ROCK2, ROCK1, SLC9A5 | CES2 2889/4885ACP1 2402/4885MAPT 1956/4885 |
| US-12578648-B2 | Rinsing liquid and pattern forming method | ALKBH5, GABBR1, DNMT3B | CES2 1577/4885ACP1 770/4885MAPT 1336/4885 |
| US-20260003270-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | ACTN1, ACTR3, MACF1 | CES2 1597/4885ACP1 160/4885MAPT 4009/4885 |
| US-12554196-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound | RER1, RAD51, GLRA1 | CES2 2873/4885ACP1 3641/4885MAPT 3416/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.