Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.54 |
| ▸ | HTT | P42858 | 4/20 | 0.52 |
| ▸ | CYP11B1 | P15538 | 3/20 | 0.47 |
| ▸ | CYP11B2 | P19099 | 3/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | TNF | P01375 | 1/20 | 0.47 |
| ▸ | FGFR1 | P11362 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | STAT6 | P42226 | 1/20 | 0.44 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11706281 | 0.98 | TDP1 (0.52) | TDP1HTTCYP11B1CYP11B2POLB | |
| SCHEMBL5399 | 0.76 | TDP1 (0.59) | TDP1HTTCYP11B1CYP11B2POLB | |
| SCHEMBL29359161 | 0.76 | TDP1 (0.59) | TDP1HTTCYP11B1CYP11B2POLB | |
| SCHEMBL460599 | 0.76 | TDP1 (0.54) | TDP1HTTCYP11B1CYP11B2POLB | |
| SCHEMBL7196401 | 0.75 | TDP1 (0.58) | TDP1HTTCYP11B1CYP11B2POLB | |
| Hydrochloric Acid SCHEMBL7206595 | 0.74 | TDP1 (0.57) | TDP1HTTCYP11B1CYP11B2POLB | |
| Bromide SCHEMBL6955674 | 0.74 | TDP1 (0.57) | TDP1HTTCYP11B1CYP11B2POLB | |
| Hydrochloric Acid SCHEMBL3713895 | 0.74 | TDP1 (0.57) | TDP1HTTCYP11B1CYP11B2POLB | |
| Iodide SCHEMBL15375366 | 0.74 | TDP1 (0.57) | TDP1HTTCYP11B1CYP11B2POLB | |
| SCHEMBL28652434 | 0.74 | TDP1 (0.57) | TDP1HTTCYP11B1CYP11B2POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3305539-B1 | THERMOSENSITIVE RECORDING MATERIAL AND METHOD FOR PRODUCING SAME | FUJIFILM CORP (JP) | 2021-04-14 | — | — | EP | disclosed |
| CN-107531069-B | Thermosensitive recording material and method for producing same | 富士胶片株式会社 | 2020-07-10 | — | — | CN | disclosed |
| US-10272708-B2 | Thermosensitive recording material and method for manufacturing the same | FUJIFILM CORPORATION (JP) | 2019-04-30 | — | — | US | disclosed |
| EP-3305539-A1 | THERMOSENSITIVE RECORDING MATERIAL AND METHOD FOR PRODUCING SAME | FUJIFILM Corporation (JP) | 2018-04-11 | — | — | EP | disclosed |
| US-20180043717-A1 | THERMOSENSITIVE RECORDING MATERIAL AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2018-02-15 | — | — | US | disclosed |
| CN-107531069-A | Thermal recording medium and its manufacture method | 富士胶片株式会社 | 2018-01-02 | — | — | CN | disclosed |
| US-7576036-B2 | Heat-sensitive recording material, heat-sensitive recording method and method for manufacturing heat-sensitive recording material | FUJIFILM CORPORATION (JP) | 2009-08-18 | — | — | US | disclosed |
| CN-101419394-A | High-sensitivity emulsion of photothermographic material, and preparation method and application thereof | CHINESE ACAD TECH INST PHYSICS (CN) | 2009-04-29 | — | — | CN | disclosed |
| US-7410744-B2 | Recording method | FUJIFILM CORPORATION (JP) | 2008-08-12 | — | — | US | disclosed |
| US-20070128542-A1 | Recording method | FUJIFILM CORPORATION (JP) | 2007-06-07 | — | — | US | disclosed |
| EP-0256820-A2 | Thermal developing light-sensitive material | KONICA CORPORATION (JP) | 1988-02-24 | — | — | EP | disclosed |
| EP-0250558-A1 | NOVEL COMPOUNDS AND NOVEL RECORDING MATERIAL USING THE SAME. | POLAROID CORP (US) | 1988-01-07 | — | — | EP | disclosed |
| EP-0190512-A2 | Positive image forming method | KONICA CORPORATION (JP) | 1986-08-13 | — | — | EP | disclosed |
| EP-0190054-A2 | Heat-processable color photosensitive material | KONICA CORPORATION (JP) | 1986-08-06 | — | — | EP | disclosed |
| US-4347310-A | INCREASED PHOTOSENZITIVITY USING GUANIDINE DERIVTIVES AS SENSITIZERS; PHOTOSTABILITY; STORAGE STABILITY | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1982-08-31 | — | — | US | disclosed |
| US-4234679-A | ORGANIC SILVER SALT, SILVER HALIDE, REDUCING AGENT, ORGANIC BROMINE COMPOUND | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1980-11-18 | — | — | US | disclosed |
| US-4212937-A | NITROGEN-CONTAINING HETEROCYCLIC BASE | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1980-07-15 | — | — | US | disclosed |
| US-4188226-A | OXIDIZER, REDUCER, HALOGENATED CARBOCYCLIC COMPOUND | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1980-02-12 | — | — | US | disclosed |
| US-4173482-A | Dry image forming material containing an organic silver salt oxidizing agent, a reducing agent and a halogen molecule | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1979-11-06 | — | — | US | disclosed |
| US-3933507-A | LIGHT INSENSITIVE SILVER SALT, POLYMETHINE SENSITIZER | AGFA-GEVAERT, A.G. (DT) | 1976-01-20 | — | — | US | disclosed |