Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 3/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | CASP1 | P29466 | 1/20 | 0.43 |
| ▸ | CASP7 | P55210 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | FDPS | P14324 | 1/20 | 0.38 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.37 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.37 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.37 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29443967 | 1.00 | CYP3A4 (0.43) | CYP3A4ALOX15CASP1CASP7SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL9834388 | 0.98 | CYP3A4 (0.42) | CYP3A4ALOX15CASP1CASP7SMN1; SMN2 | |
| Dimethylamine SCHEMBL11264463 | 0.93 | SIGMAR1 (0.39) | CYP3A4ALOX15CASP1CASP7SMN1; SMN2 | |
| Catechol SCHEMBL11031358 | 0.89 | TSHR (0.48) | CYP3A4ALOX15SMN1; SMN2SIGMAR1ALDH1A1 | |
| Benzenethiol SCHEMBL27943515 | 0.88 | SIGMAR1 (0.38) | CYP3A4ALOX15CASP1CASP7SMN1; SMN2 | |
| SCHEMBL29573660 | 0.86 | TLR8 (0.49) | CYP3A4ALOX15CASP1CASP7SMN1; SMN2 | |
| SCHEMBL44325 | 0.86 | TLR8 (0.49) | CYP3A4ALOX15CASP1CASP7SMN1; SMN2 | |
| Formic Acid Methyl Ester SCHEMBL28281257 | 0.84 | CYP1A2 (0.37) | SIGMAR1CYP1A2CYP2C9CYP2C19ALDH1A1 | |
| SCHEMBL981336 | 0.84 | LIPG (0.55) | CYP1A2CYP2C9CYP2C19LIPG | |
| Methylamine SCHEMBL27652474 | 0.84 | TLR8 (0.47) | CYP3A4ALOX15CASP1CASP7SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2635 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12559517-B2 | Oligonucleotide manufacturing method | AJINOMOTO CO., INC. (JP) | 2026-02-24 | — | — | US | claimed |
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| CN-117926001-A | Carbonyl acid extractant for extracting and separating germanium | 有研资源环境技术研究院(北京)有限公司 | 2024-04-26 | — | — | CN | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| US-20230367235-A1 | SCRATCH-RESISTANT AND DURABLE ELECTROPHOTOGRAPHIC PHOTORECEPTOR | NANO AND ADVANCED MATERIALS INSTITUTE LIMITED (HK) | 2023-11-16 | — | — | US | claimed |
| CN-117055312-A | Scratch-resistant and durable electrophotographic photoreceptor | 纳米及先进材料研发院有限公司 | 2023-11-14 | — | — | CN | claimed |
| CN-116672974-A | Jet hydrogenation reactor | 西安本清化学技术有限公司 | 2023-09-01 | — | — | CN | claimed |
| CN-112892232-B | Organic solvent-resistant nanofiltration composite membrane, preparation method and application | 天津大学 | 2023-02-28 | — | — | CN | claimed |
| CN-1574218-A | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-02-02 | — | — | CN | claimed |
| US-20040259040-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-23 | — | — | US | claimed |
| US-6825391-B2 | SILICOALUMINOPHOSPHATES (SAPO); LIQUIDS AND VAPORS COMPRISE METHANOL, ETHANOL, DIMETHYL ETHER, ACETONE, PROPYLAMINE, AND/OR ACETONITRILE | EXXONMOBIL CHEMICAL PATENTS INC. | 2004-11-30 | — | — | US | claimed |
| EP-1422218-A1 | ANTIVIRAL AGENT | SHIONOGI & CO., LTD. (JP) | 2004-05-26 | — | — | EP | claimed |
| EP-1202798-A1 | USE OF A COMPOSITE POLYMER-COATED SORBENT FOR SEPARATION, PURIFICATION, DESALTING AND CONCENTRATION OF BIOPOLYMERS | Nexttec GmbH (DE) | 2002-05-08 | — | — | EP | claimed |
| WO-2000064579-A1 | USE OF A COMPOSITE POLYMER-COATED SORBENT FOR SEPARATION, PURIFICATION, DESALTING AND CONCENTRATION OF BIOPOLYMERS | NEXTTEC GMBH (DE) | 2000-11-02 | — | — | WO | claimed |
| US-5041524-A | Polyphosphazene derivatives containing carbonyl groups suitable for photoreticulation processes | CONSIGLIO NAZIONALE DELLE RICERCHE (IT) | 1991-08-20 | — | — | US | claimed |
| EP-0362725-A1 | Process for producing water insoluble azo dyes on the fibre according to the ice-colour technique | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-04-11 | — | — | EP | claimed |
| US-4857657-A | Preparation of hexenedioic acid diesters | RHONE-POULENC CHIMIE (FR) | 1989-08-15 | — | — | US | claimed |
| EP-0019232-B1 | A PROCESS FOR THE PREPARATION OF POLYURETHANE-UREA ELASTOMERS | BAYER AG (DE) | 1982-05-26 | — | — | EP | claimed |