Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 13/20 | 0.40 |
| ▸ | HTR1D | P28221 | 3/20 | 0.37 |
| ▸ | HTR1B | P28222 | 3/20 | 0.37 |
| ▸ | HTR1A | P08908 | 1/20 | 0.37 |
| ▸ | MTNR1B | P49286 | 8/20 | 0.37 |
| ▸ | GPBAR1 | Q8TDU6 | 2/20 | 0.37 |
| ▸ | CYSLTR2 | Q9NS75 | 1/20 | 0.37 |
| ▸ | CYSLTR1 | Q9Y271 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL3364319 | 0.77 | KCNH2 (0.35) | — | |
| SCHEMBL6398679 | 0.77 | KDM4E (0.34) | — | |
| SCHEMBL1533147 | 0.73 | GAA (0.30) | — | |
| SCHEMBL4172511 | 0.71 | GPBAR1 (0.40) | MTNR1AGPBAR1CYSLTR2CYSLTR1 | |
| SCHEMBL3363813 | 0.70 | KDM4E (0.32) | — | |
| SCHEMBL30019751 | 0.70 | HTR1B (0.38) | HTR1DHTR1B | |
| SCHEMBL6399777 | 0.69 | KDM4E (0.34) | — | |
| SCHEMBL347957 | 0.68 | CA12 (0.54) | MTNR1AHTR1DHTR1BHTR1AGPBAR1 | |
| SCHEMBL10604096 | 0.68 | KCNA3 (0.54) | MTNR1AHTR1DHTR1BHTR1AGPBAR1 | |
| SCHEMBL19583365 | 0.68 | TDP1 (0.53) | MTNR1AHTR1DHTR1BHTR1AGPBAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2130095-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM FORMING METHOD USING THE SAME | Fujifilm Corporation (JP) | 2009-12-09 | — | — | EP | disclosed |
| WO-2008123563-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-16 | — | — | WO | disclosed |