Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.32 |
| ▸ | HRH3 | Q9Y5N1 | 2/20 | 0.31 |
| ▸ | CNR1 | P21554 | 1/20 | 0.31 |
| ▸ | CNR2 | P34972 | 1/20 | 0.31 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6398679 | 0.94 | KDM4E (0.34) | KDM4EALDH1A1RXFP1HRH3CNR1 | |
| SCHEMBL6399812 | 0.92 | KDM4E (0.33) | KDM4EALDH1A1RXFP1MCHR1 | |
| SCHEMBL6399777 | 0.91 | KDM4E (0.34) | KDM4EALDH1A1RXFP1HRH3CNR1 | |
| SCHEMBL6394293 | 0.90 | KDM4E (0.37) | KDM4EALDH1A1RXFP1CNR1CNR2 | |
| SCHEMBL6393344 | 0.87 | APLNR (0.33) | KDM4EALDH1A1RXFP1CNR1CNR2 | |
| SCHEMBL6393536 | 0.87 | KDM4E (0.32) | KDM4EALDH1A1RXFP1MCHR1 | |
| SCHEMBL6392402 | 0.85 | KDM4E (0.33) | KDM4EALDH1A1RXFP1 | |
| SCHEMBL3365940 | 0.85 | KDM4E (0.37) | KDM4EALDH1A1RXFP1CNR1CNR2 | |
| Trifluoromethanesulfonic Acid SCHEMBL2745921 | 0.84 | ACHE (0.31) | — | |
| SCHEMBL3367546 | 0.83 | CNR1 (0.33) | KDM4EALDH1A1RXFP1CNR1CNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-6964840-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-15 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| US-6800414-B2 | FLUOROPOLYMER | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |