SCHEMBL6398679

SCHEMBL6398679

CCCCCCCCS(=O)(=O)[O-].CCCCOC1CC[S+](c2cccc3ccccc23)C1

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.34
ALDH1A1 P00352 1/20 0.34
RXFP1 Q9HBX9 1/20 0.34
L3MBTL1 Q9Y468 2/20 0.33
TDP1 Q9NUW8 2/20 0.33
GAA P10253 1/20 0.33
SLC2A1 P11166 1/20 0.32
CNR1 P21554 3/20 0.32
CNR2 P34972 3/20 0.32
MCHR1 Q99705 1/20 0.31
KMT2A Q03164 1/20 0.31
MAPT P10636 2/20 0.30
CYP2C9 P11712 2/20 0.30
HRH3 Q9Y5N1 2/20 0.30
POLB P06746 1/20 0.30
HPGD P15428 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3363813 0.94 KDM4E (0.32) KDM4EALDH1A1RXFP1CNR1CNR2
SCHEMBL6399777 0.93 KDM4E (0.34) KDM4EALDH1A1RXFP1L3MBTL1TDP1
SCHEMBL6399812 0.91 KDM4E (0.33) KDM4EALDH1A1RXFP1L3MBTL1MCHR1
SCHEMBL6394293 0.90 KDM4E (0.37) KDM4EALDH1A1RXFP1L3MBTL1TDP1
SCHEMBL6393536 0.90 KDM4E (0.32) KDM4EALDH1A1RXFP1MCHR1
SCHEMBL6393344 0.90 APLNR (0.33) KDM4EALDH1A1RXFP1CNR1CNR2
SCHEMBL3367546 0.87 CNR1 (0.33) KDM4EALDH1A1RXFP1L3MBTL1SLC2A1
Trifluoromethanesulfonic Acid SCHEMBL3364319 0.87 KCNH2 (0.35) L3MBTL1TDP1GAASLC2A1CNR1
SCHEMBL3362985 0.86 CNR1 (0.33) KDM4EALDH1A1RXFP1L3MBTL1CNR1
SCHEMBL6392402 0.85 KDM4E (0.33) KDM4EALDH1A1RXFP1L3MBTL1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6964840-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-15 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed
US-6800414-B2 FLUOROPOLYMER JSR CORPORATION (JP) 2004-10-05 US disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed