Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 7/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | CNR1 | P21554 | 1/20 | 0.31 |
| ▸ | CNR2 | P34972 | 1/20 | 0.31 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1533147 | 0.91 | GAA (0.30) | GAATDP1L3MBTL1 | |
| SCHEMBL6239896 | 0.90 | GAA (0.30) | GAATDP1L3MBTL1 | |
| Trifluoromethanesulfonic Acid SCHEMBL3366125 | 0.90 | HPGD (0.32) | KCNH2 | |
| Trifluoromethanesulfonic Acid SCHEMBL2745921 | 0.89 | ACHE (0.31) | — | |
| SCHEMBL6398679 | 0.87 | KDM4E (0.34) | GAATDP1L3MBTL1CNR1CNR2 | |
| Trifluoromethanesulfonic Acid SCHEMBL3365764 | 0.87 | CNR1 (0.32) | KCNH2GAATDP1L3MBTL1CNR1 | |
| SCHEMBL1532851 | 0.86 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL3364019 | 0.86 | ALDH1A1 (0.30) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL3364433 | 0.86 | ACHE (0.32) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6845188 | 0.84 | ACHE (0.32) | CNR1CNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-6964840-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-15 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| US-6800414-B2 | FLUOROPOLYMER | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |