Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4401669 | 0.85 | ALDH1A1 (0.33) | CYP2D6CYP2C19ALDH1A1 | |
| SCHEMBL1451564 | 0.83 | ALOX15 (0.39) | CYP2D6CYP2C19 | |
| SCHEMBL31695326 | 0.83 | CYP2D6 (0.32) | CYP2D6CYP2C19 | |
| SCHEMBL7863152 | 0.80 | CYP2D6 (0.36) | CYP2D6CYP2C19 | |
| SCHEMBL19771478 | 0.80 | CYP2D6 (0.32) | CYP2D6CYP2C19 | |
| SCHEMBL4399242 | 0.78 | CYP2D6 (0.36) | CYP2D6CYP2C19 | |
| SCHEMBL4401912 | 0.78 | CYP2D6 (0.31) | CYP2D6CYP2C19 | |
| SCHEMBL4399237 | 0.78 | CYP2D6 (0.39) | CYP2D6CYP2C19ALDH1A1 | |
| SCHEMBL5347779 | 0.78 | CYP2D6 (0.34) | CYP2D6CYP2C19 | |
| SCHEMBL32689135 | 0.77 | CYP2D6 (0.35) | CYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230174471-A1 | ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME | INHA INDUSTRY PARTNERSHIP INSTITUTE (KR) | 2023-06-08 | — | — | US | disclosed |
| US-10191373-B2 | Method for producing polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-01-29 | — | — | US | disclosed |
| US-10007178-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-10005868-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-9927708-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9927708-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9910358-B2 | Patterning process and chemically amplified negative resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-06 | — | — | US | disclosed |
| US-20180024435-A1 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-20180024435-A1 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-9869931-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| US-20080166660-A1 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-07-10 | — | — | US | disclosed |
| EP-1364975-B1 | PROCESSES FOR PRODUCING CYCLOOLEFIN ADDITION POLYMER | JSR CORP (JP) | 2008-04-30 | — | — | EP | disclosed |
| US-20070225461-A1 | Olefin polymers for imaging members | LEXMARK INTERNATIONAL INC. | 2007-09-27 | — | — | US | disclosed |
| US-20070218401-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-09-20 | — | — | US | disclosed |
| US-20070218401-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-09-20 | — | — | US | disclosed |
| US-6911507-B2 | Processes for producing cycloolefin addition polymer | JSR CORPORATION (JP) | 2005-06-28 | — | — | US | disclosed |
| US-6790914-B2 | TRANSPARENT (CROSSLINKED) RESIN FILM CAN BE USED AS A POLARIZING FILM, SURFACE PROTECTIVE FILM, RETARDATION FILM, TRANSPARENT CONDUCTIVE FILM, LIGHT DIFFUSION FILM, FILM FOR AN EL DISPLAY DEVICE, TRANSPARENT CONDUCTIVE COMPOSITE MATERIAL, | JSR CORPORATION (JP) | 2004-09-14 | — | — | US | disclosed |
| US-20040106740-A1 | Resin film and applications thereof | JSR CORPORATION (JP) | 2004-06-03 | — | — | US | disclosed |
| US-20040063873-A1 | Processes for producing cycloolefin addition polymer | JSR CORPORATION (JP) | 2004-04-01 | — | — | US | disclosed |
| EP-1364975-A1 | PROCESSES FOR PRODUCING CYCLOOLEFIN ADDITION POLYMER | JSR Corporation (JP) | 2003-11-26 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230174471-A1 | ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME | PARP10, ADCY10, APRT | CYP2D6 3095/4885CYP2C19 1957/4885ALDH1A1 83/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.