SCHEMBL4401562

SCHEMBL4401562

O=Cc1cc2c(c3ccccc13)CC=C2

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MCL1 Q07820 1/20 0.38
MEN1 O00255 1/20 0.35
LMNA P02545 1/20 0.35
THRB P10828 1/20 0.35
BLM P54132 1/20 0.35
KMT2A Q03164 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
PTPN1 P18031 1/20 0.34
MAOA P21397 1/20 0.34
MAOB P27338 1/20 0.34
CYP2A6 P11509 2/20 0.33
IMPDH2 P12268 2/20 0.33
ALDH1A1 P00352 2/20 0.32
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
TSHR P16473 1/20 0.31
TRIM24 O15164 1/20 0.31
TRIM33 Q9UPN9 1/20 0.31
ERN1 O75460 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4403403 0.81 MEN1 (0.34) MEN1LMNATHRBBLMKMT2A
SCHEMBL2973126 0.73 MEN1 (0.33) MEN1KMT2AALDH1A1
SCHEMBL4403398 0.72 MCL1 (0.38) MCL1MEN1LMNATHRBBLM
SCHEMBL2859416 0.71 MEN1 (0.41) MEN1LMNATHRBBLMKMT2A
SCHEMBL29561776 0.71 MEN1 (0.41) MEN1LMNATHRBBLMKMT2A
SCHEMBL4405538 0.70 ERN1 (0.41) MEN1LMNATHRBBLMKMT2A
SCHEMBL1881213 0.70 MPL (0.41) MEN1THRBBLMKMT2ATDP1
SCHEMBL4403295 0.70 ERN1 (0.41) MCL1MEN1LMNATHRBBLM
SCHEMBL27718737 0.69 MEN1 (0.39) MEN1LMNATHRBBLMKMT2A
SCHEMBL5757691 0.67 MCL1 (0.39) MCL1MEN1LMNATHRBBLM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
EP-2447775-A1 Resist underlayer film composition and patterning process using the same Shin-Etsu Chemical Co., Ltd. (JP) 2012-05-02 EP disclosed