SCHEMBL4405538

SCHEMBL4405538

O=Cc1cc2ccccc2c2c1C=CC2

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ERN1 O75460 5/20 0.41
ALDH1A1 P00352 2/20 0.34
GAA P10253 1/20 0.34
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
LMNA P02545 1/20 0.33
THRB P10828 1/20 0.33
BLM P54132 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
TSHR P16473 1/20 0.33
PTPN1 P18031 3/20 0.33
MAOA P21397 1/20 0.33
MAOB P27338 1/20 0.33
POLB P06746 2/20 0.32
KDM4E B2RXH2 1/20 0.32
ATM Q13315 1/20 0.32
CYP2A6 P11509 4/20 0.32
IMPDH2 P12268 1/20 0.32
ALOX5 P09917 1/20 0.31
CYP1A2 P05177 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4403295 0.87 ERN1 (0.41) ERN1ALDH1A1GAAMEN1KMT2A
SCHEMBL2968049 0.75 ALDH1A1 (0.38) ALDH1A1MEN1KMT2ATSHRKDM4E
SCHEMBL8368595 0.71 PAX8 (0.47) ALDH1A1MEN1KMT2ALMNATDP1
SCHEMBL4403398 0.70 MCL1 (0.38) ERN1ALDH1A1MEN1KMT2ALMNA
SCHEMBL4401562 0.70 MCL1 (0.38) ERN1ALDH1A1MEN1KMT2ALMNA
SCHEMBL419485 0.69 ERN1 (0.51) ERN1ALDH1A1MEN1KMT2ALMNA
SCHEMBL29388348 0.69 ERN1 (0.51) ERN1ALDH1A1MEN1KMT2ALMNA
SCHEMBL2967846 0.68 ALDH1A1 (0.38) ALDH1A1MEN1KMT2AMAOAKDM4E
SCHEMBL30627931 0.67
SCHEMBL302728 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
EP-2447775-A1 Resist underlayer film composition and patterning process using the same Shin-Etsu Chemical Co., Ltd. (JP) 2012-05-02 EP disclosed