SCHEMBL4403285

SCHEMBL4403285

O=Cc1cccc2c1CCC=C2

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.38
LMNA P02545 1/20 0.38
THRB P10828 1/20 0.38
BLM P54132 1/20 0.38
KMT2A Q03164 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
ERN1 O75460 4/20 0.34
CYP2A6 P11509 1/20 0.34
ALDH1A1 P00352 1/20 0.32
TSHR P16473 1/20 0.32
TRIM24 O15164 1/20 0.32
TRIM33 Q9UPN9 1/20 0.32
KCNJ1 P48048 1/20 0.30
TLR2 O60603 1/20 0.30
TLR1 Q15399 1/20 0.30
TLR6 Q9Y2C9 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4408128 0.82 MEN1 (0.32) MEN1LMNATHRBBLMKMT2A
SCHEMBL2859416 0.81 MEN1 (0.41) MEN1LMNATHRBBLMKMT2A
SCHEMBL29561776 0.81 MEN1 (0.41) MEN1LMNATHRBBLMKMT2A
SCHEMBL10067903 0.80 CYP2A6 (0.36) MEN1LMNATHRBBLMKMT2A
SCHEMBL27718737 0.79 MEN1 (0.39) MEN1LMNATHRBBLMKMT2A
SCHEMBL18564382 0.75
SCHEMBL28369479 0.71 TDP1 (0.42) MEN1LMNAKMT2ATDP1ALDH1A1
SCHEMBL9822478 0.71 ADRA2A (0.36) LMNACYP2A6TSHR
SCHEMBL7650577 0.71 CD44 (0.36) MEN1LMNAKMT2ATDP1ALDH1A1
SCHEMBL6749423 0.71 BCL2L1 (0.41) LMNABLMTDP1ALDH1A1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
EP-2447775-B1 Resist underlayer film composition and patterning process using the same SHINETSU CHEMICAL CO (JP) 2013-05-29 EP disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
EP-2447775-A1 Resist underlayer film composition and patterning process using the same Shin-Etsu Chemical Co., Ltd. (JP) 2012-05-02 EP disclosed