Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.30 |
| ▸ | ERN1 | O75460 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4403403 | 0.84 | MEN1 (0.34) | MEN1LMNATHRBBLMKMT2A | |
| SCHEMBL4403285 | 0.82 | MEN1 (0.38) | MEN1LMNATHRBBLMKMT2A | |
| SCHEMBL27781003 | 0.79 | — | — | |
| SCHEMBL10067903 | 0.77 | CYP2A6 (0.36) | MEN1LMNATHRBBLMKMT2A | |
| SCHEMBL10676333 | 0.76 | ALDH1A1 (0.45) | MEN1LMNABLMKMT2ATDP1 | |
| SCHEMBL10676767 | 0.73 | HSD17B10 (0.40) | MEN1KMT2A | |
| SCHEMBL3420267 | 0.72 | HPRT1 (0.48) | MEN1LMNAKMT2ATDP1CYP2A6 | |
| SCHEMBL21294098 | 0.72 | HPRT1 (0.48) | MEN1LMNAKMT2ATDP1CYP2A6 | |
| SCHEMBL18564382 | 0.72 | — | — | |
| SCHEMBL4448971 | 0.71 | CYP2A6 (0.36) | TDP1CYP2A6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8877422-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8877422-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| US-20120108071-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20120108071-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| EP-2447775-A1 | Resist underlayer film composition and patterning process using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-05-02 | — | — | EP | disclosed |