SCHEMBL4416358

SCHEMBL4416358

O=P(O)(O)c1ccc[nH]1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2529755 0.80 DAO (0.35) —
SCHEMBL3069505 0.79 FKBP5 (0.42) —
SCHEMBL11430431 0.73 DAO (0.35) —
SCHEMBL8615915 0.69 HDAC8 (0.48) —
Phosphoric Acid SCHEMBL28066557 0.68 DAO (0.43) —
Phosphoric Acid SCHEMBL25244811 0.65 GRIN2D (0.44) —
SCHEMBL12786031 0.65 SRC (0.45) —
SCHEMBL2171752 0.62 CA2 (0.71) —
SCHEMBL11650294 0.62 ESR1 (0.46) —
SCHEMBL4286239 0.60 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108982884-B A kind of metronidazole measuring method using agar base weight metal absorbent 苏州欧福蛋业股份有限公司 2019-04-05 — — CN claimed
CN-108982884-A A kind of metronidazole measuring method using agar base weight metal absorbent 苏州欧福蛋业股份有限公司 2018-12-11 — — CN claimed
US-5277788-A Twice-anodized aluminum article having an organo-phosphorus monolayer and process for making the article ALUMINUM COMPANY OF AMERICA (US) 1994-01-11 — — US claimed
US-20250133947-A1 Thermal Evaporation-Growth of Halide Perovskites Through Phosphonic Acid Addition GEORGIA TECH RES INST (US) 2025-04-24 — — US disclosed
CN-116143840-A Phosphono deazapurine derivative and preparation method and application thereof 浙江工业大学 2023-05-23 — — CN disclosed
CN-108982884-B A kind of metronidazole measuring method using agar base weight metal absorbent 苏州欧福蛋业股份有限公司 2019-04-05 — — CN disclosed
CN-108982884-A A kind of metronidazole measuring method using agar base weight metal absorbent 苏州欧福蛋业股份有限公司 2018-12-11 — — CN disclosed
CN-107920973-A Surface composition for modifying 株式会社LG生活健康 2018-04-17 — — CN disclosed
CN-102209517-B Composition with a color marker COLGATE PALMOLIVE CO 2014-03-19 — — CN disclosed
US-7635748-B2 Resin and article molded therefrom TORAY INDUSTRIES, INC. (JP) 2009-12-22 — — US disclosed
EP-1270646-B1 RESIN COMPOSITION AND ARTICLES MOLDED THEREFROM TORAY INDUSTRIES (JP) 2008-11-26 — — EP disclosed
EP-1640405-A1 RESIN AND ARTICLE MOLDED THEREFROM TORAY INDUSTRIES, INC. (JP) 2006-03-29 — — EP disclosed
US-20060047104-A1 Resin, resin composition, process for production thereof, and moldings made by using the same TORAY INDUSTRIES, INC. (JP) 2006-03-02 — — US disclosed
CN-1649940-A Resin, resin compositions, process for production thereof, and moldings made by using the same TORAY INDUSTRIES (JP) 2005-08-03 — — CN disclosed
EP-1518884-A1 RESIN, RESIN COMPOSITIONS, PROCESS FOR PRODUCTION THEREOF, AND MOLDINGS MADE BY USING THE SAME TORAY INDUSTRIES, INC. (JP) 2005-03-30 — — EP disclosed
US-6750313-B2 HIGH REFRACTIVE INDEX AND LOW DISPERSION CHARACTERISTICS; OPTICAL LENSES, FILMS, DISCS; POLYCARBONATE RESIN CONTAINING A PHOSPHONIC ACID GROUP TORAY INDUSTRIES, INC. (JP) 2004-06-15 — — US disclosed
US-20030013836-A1 Resin composition and articles molded therefrom TORAY INDUSTRIES, INC., A CORPORATION OF JAPAN (JP) 2003-01-16 — — US disclosed
EP-1270646-A1 RESIN COMPOSITION AND ARTICLES MOLDED THEREFROM TORAY INDUSTRIES, INC. (JP) 2003-01-02 — — EP disclosed
CN-1074933-C Anti-stress, anti-impairment and anti-aging drug and process for manufacturing thereof RIGA D (RO) 2001-11-21 — — CN disclosed
US-5277788-A Twice-anodized aluminum article having an organo-phosphorus monolayer and process for making the article ALUMINUM COMPANY OF AMERICA (US) 1994-01-11 — — US disclosed
Send feedback