Tetrahydrothiophene

Tetrahydrothiophene

SCHEMBL4416580

C1CCSC1.CC(C)OC(=O)Oc1ccc(OS(=O)(=O)C(F)(F)F)c2ccccc12

nearest known ligand 0.32

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CXCR2 P25025 2/20 0.32
DRD2 P14416 1/20 0.32
DRD1 P21728 1/20 0.32
DRD4 P21917 1/20 0.32
DRD5 P21918 1/20 0.32
DRD3 P35462 1/20 0.32
MMP2 P08253 1/20 0.32
MMP9 P14780 1/20 0.32
MMP14 P50281 1/20 0.32
CXCR1 P25024 1/20 0.32
KCNJ11 Q14654 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrahydrothiophene SCHEMBL4423294 0.90 KDM4E (0.38) CXCR2DRD2DRD1DRD4DRD5
Tetrahydrothiophene SCHEMBL4414225 0.86 DRD2 (0.32) DRD2DRD1DRD4DRD5DRD3
Tetrahydrothiophene SCHEMBL4423403 0.85 TYMS (0.39) DRD2DRD1DRD4DRD5DRD3
Tetrahydrothiophene SCHEMBL6564875 0.81 GAA (0.34) DRD2DRD1DRD4DRD5DRD3
Tetrahydrothiophene SCHEMBL23420978 0.80 ALDH1A1 (0.39) DRD2DRD1DRD4DRD5DRD3
Tetrahydrothiophene SCHEMBL4416481 0.80 DRD2 (0.36) CXCR2DRD2DRD1DRD4DRD5
Tetrahydrothiophene SCHEMBL15675859 0.79 ESR1 (0.41) DRD2DRD1DRD4DRD5DRD3
SCHEMBL2519048 0.76
SCHEMBL30003452 0.75 TSHR (0.44)
SCHEMBL23271942 0.75 TSHR (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1270553-B1 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR CORP (JP) 2009-11-18 EP disclosed
EP-1270553-A2 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR Corporation (JP) 2003-01-02 EP disclosed