Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.48 |
| ▸ | CA2 | P00918 | 3/20 | 0.48 |
| ▸ | MAPT | P10636 | 4/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | PPARG | P37231 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 2/20 | 0.36 |
| ▸ | PKM | P14618 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.35 |
| ▸ | PPARA | Q07869 | 1/20 | 0.34 |
| ▸ | STS | P08842 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6047039 | 1.00 | CA1 (0.48) | CA1CA2MAPTL3MBTL1PPARG | |
| SCHEMBL6047046 | 1.00 | CA1 (0.48) | CA1CA2MAPTL3MBTL1PPARG | |
| SCHEMBL4416245 | 0.95 | CA1 (0.43) | CA1CA2MAPTL3MBTL1PPARG | |
| SCHEMBL4425313 | 0.88 | CA1 (0.47) | CA1CA2MAPTL3MBTL1PPARG | |
| SCHEMBL6047056 | 0.84 | CA1 (0.36) | CA1CA2MAPTL3MBTL1PPARG | |
| SCHEMBL14948937 | 0.83 | MAPT (0.46) | MAPTL3MBTL1GAAPKMRAB9A | |
| SCHEMBL4415099 | 0.82 | CA1 (0.41) | CA1CA2MAPTL3MBTL1PPARG | |
| SCHEMBL19691441 | 0.81 | MAPT (0.45) | MAPTL3MBTL1GAAPKMRAB9A | |
| SCHEMBL13431266 | 0.79 | MAPT (0.43) | MAPTL3MBTL1GAAPKMRAB9A | |
| SCHEMBL13583844 | 0.78 | L3MBTL1 (0.49) | MAPTL3MBTL1GAAPKMRAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170371240-A1 | IMPRINT RESIST WITH FLUORINATED PHOTOINITIATOR AND SUBSTRATE PRETREATMENT FOR REDUCING FILL TIME IN NANOIMPRINT LITHOGRAPHY | CANON KABUSHIKI KAISHA (JP) | 2017-12-28 | — | — | US | disclosed |
| EP-1392779-B1 | FLUORINATED-PHOTOINITIATORS IN DUAL CURE RESINS | CIBA HOLDING INC (CH) | 2009-04-22 | — | — | EP | disclosed |
| EP-1392779-B1 | FLUORINATED-PHOTOINITIATORS IN DUAL CURE RESINS | CIBA HOLDING INC (CH) | 2009-04-22 | — | — | EP | disclosed |
| US-20040067311-A1 | Fluorinated-photoinitiators in dual cure resins | CIBA SPECIALTY CHEMICALS CORP. | 2004-04-08 | — | — | US | disclosed |
| EP-1392779-A1 | FLUORINATED-PHOTOINITIATORS IN DUAL CURE RESINS | Ciba SC Holding AG (CH) | 2004-03-03 | — | — | EP | disclosed |
| WO-2002040602-A1 | FLUORINATED-PHOTOINITIATORS IN DUAL CURE RESINS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2002-05-23 | — | — | WO | disclosed |