SCHEMBL443540

SCHEMBL443540

CCCOCCC(=O)OCC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.48
GAA P10253 2/20 0.48
MGAM O43451 1/20 0.48
SI P14410 1/20 0.48
MGAM2 Q2M2H8 1/20 0.48
ALDH1A1 P00352 5/20 0.44
TRPA1 O75762 1/20 0.44
DGKA P23743 1/20 0.43
LMNA P02545 3/20 0.41
MAPT P10636 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
CYP4F2 P78329 2/20 0.40
CYP4A11 Q02928 2/20 0.40
NR1I2 O75469 1/20 0.39
PGR P06401 1/20 0.39
ADORA3 P0DMS8 1/20 0.39
PTGS2 P35354 1/20 0.39
PDE4D Q08499 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
HSD17B10 Q99714 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12971983 0.98 CYP1A2 (0.47) CYP1A2GAAMGAMSIMGAM2
SCHEMBL6817948 0.93 GAA (0.55) CYP1A2GAAMGAMSIMGAM2
SCHEMBL14513868 0.91 DGKA (0.45) CYP1A2GAAMGAMSIMGAM2
SCHEMBL13754179 0.91 GAA (0.52) CYP1A2GAAMGAMSIMGAM2
SCHEMBL1727365 0.91 GAA (0.52) CYP1A2GAAMGAMSIMGAM2
SCHEMBL443342 0.88 DGKA (0.50) ALDH1A1DGKALMNAMAPTL3MBTL1
SCHEMBL448045 0.87 DGKA (0.50) CYP1A2GAAMGAMSIMGAM2
SCHEMBL8430494 0.87 CYP1A2 (0.55) CYP1A2GAAMGAMSIMGAM2
SCHEMBL7886826 0.86 DGKA (0.50) CYP1A2GAAMGAMSIMGAM2
SCHEMBL21618267 0.86 DGKA (0.52) ALDH1A1DGKALMNAMAPTL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 386 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250270481-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2025-08-28 US claimed
US-12637529-B2 Resin composition and display device using the same SAMSUNG DISPLAY CO., LTD. (KR) 2026-05-26 US disclosed
US-20250270481-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2025-08-28 US disclosed
US-20250230356-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2025-07-17 US disclosed
CN-112947012-B Photosensitive resin and thinner composition for removing antireflection film, and photosensitive resin and method for removing antireflection film using same 东友精细化工有限公司 2025-04-11 CN disclosed
WO-2025071108-A1 RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2025-04-03 WO disclosed
WO-2024158178-A1 THERMOSETTING RESIN COMPOSITION, CURED FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2024-08-02 WO disclosed
WO-2024147537-A1 RESIN COMPOSITION FOR ANTI-REFLECTION FILM, ANTI-REFLECTION FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2024-07-11 WO disclosed
US-20240199913-A1 METHOD FOR SUPPRESSING COLLAPSE OF THREE-DIMENSIONAL STRUCTURE TOKYO OHKA KOGYO CO., LTD. (JP) 2024-06-20 US disclosed
CN-109976097-B Method of forming micropattern and substrate processing apparatus 三星电子株式会社 2024-06-18 CN disclosed
US-6126513-A Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters TOKYO OHKA KOGYO CO., LTD. (JP) 2000-10-03 US disclosed
US-6071673-A Method for the formation of resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2000-06-06 US disclosed
US-6054545-A CELLULOSE MODIFIED WITH CARBOXYLATED ISOCYANATE TOKYO OHKA KOGYO CO., LTD. (JP) 2000-04-25 US disclosed
EP-0562819-B1 Resist coating composition JSR CORP (JP) 1999-12-01 EP disclosed
EP-0908780-A1 Process for forming a cured film of a thermosetting resin JSR Corporation (JP) 1999-04-14 EP disclosed
EP-0894808-A1 Modified cellulose compound and photopolymerizable resin composition containing the same TOKYO OHKA KOGYO CO., LTD. (JP) 1999-02-03 EP disclosed
EP-0890417-A1 Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters TOKYO OHKA KOGYO CO., LTD. (JP) 1999-01-13 EP disclosed
EP-0562819-A2 Resist coating composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-09-29 EP disclosed
US-4978754-A REACTING B-ALKOXY-SUBSTITUTED CARBOXYLATE WITH CYCLIC AMINE, REMOVING ALCOHOL IN PRESENCE OF BASIC CATALYST MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1990-12-18 US disclosed
EP-0321256-A2 Process of preparing unsaturated carboxylic acid amides MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-06-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12637529-B2 Resin composition and display device using the same JMJD6, ALKBH2, ARID2 CYP1A2 571/4885GAA 2968/4885MGAM 551/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.