Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | FAAH | O00519 | 4/20 | 0.38 |
| ▸ | CNR1 | P21554 | 1/20 | 0.38 |
| ▸ | CNR2 | P34972 | 1/20 | 0.38 |
| ▸ | PLA2G2C | Q5R387 | 1/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | CES2 | O00748 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7205921 | 0.93 | NAAA (0.52) | NAAALMNAFAAHCNR1CNR2 | |
| SCHEMBL445697 | 0.89 | TDP1 (0.50) | NAAALMNATDP1FAAHCNR1 | |
| SCHEMBL27625739 | 0.88 | TDP1 (0.40) | NAAALMNATDP1FAAHCNR1 | |
| SCHEMBL7037545 | 0.87 | LMNA (0.46) | LMNATDP1FAAHCNR1CNR2 | |
| SCHEMBL27628046 | 0.87 | TDP1 (0.42) | LMNATDP1FAAHCNR1CNR2 | |
| SCHEMBL2230726 | 0.87 | LMNA (0.50) | LMNATDP1TSHRALDH1A1CYP1A2 | |
| SCHEMBL18157282 | 0.87 | NAAA (0.46) | NAAALMNATDP1FAAHCNR1 | |
| SCHEMBL1091854 | 0.86 | LMNA (0.58) | LMNAALDH1A1MAPT | |
| SCHEMBL1091356 | 0.86 | LMNA (0.58) | LMNAALDH1A1MAPT | |
| SCHEMBL1470241 | 0.85 | PLA2G2C (0.44) | LMNATDP1PLA2G2CUSP2SPHK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 245 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |
| US-20250180989-A1 | COMPOSITION FOR PRETREATMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-05 | — | — | US | disclosed |
| WO-2025071108-A1 | RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2025-04-03 | — | — | WO | disclosed |
| CN-118830065-A | Pretreatment composition | 日产化学株式会社 | 2024-10-22 | — | — | CN | disclosed |
| WO-2024158178-A1 | THERMOSETTING RESIN COMPOSITION, CURED FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2024-08-02 | — | — | WO | disclosed |
| CN-118344798-A | Aqueous 2K coating composition | 巴斯夫涂料有限公司 | 2024-07-16 | — | — | CN | disclosed |
| WO-2024147537-A1 | RESIN COMPOSITION FOR ANTI-REFLECTION FILM, ANTI-REFLECTION FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2024-07-11 | — | — | WO | disclosed |
| CN-109976097-B | Method of forming micropattern and substrate processing apparatus | 三星电子株式会社 | 2024-06-18 | — | — | CN | disclosed |
| CN-110007563-B | Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element | 奇美实业股份有限公司 | 2024-04-02 | — | — | CN | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| US-20030054284-A1 | Radiation-sensitive composition, insulating film and organic el display element | JSR CORPORATION (JP) | 2003-03-20 | — | — | US | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| US-6399267-B1 | COPOLYMER CONTAINING UNSATURATED CARBOXY ACID OR ANHYDRIDE AND MONOMER OF EPOXY CONTAINING ACRYLIC ESTER | JSR CORPORATION (JP) | 2002-06-04 | — | — | US | disclosed |
| US-20020055059-A1 | Radiation sensitive resin composition, cathode separator and el display device | JSR CORPORATION (JP) | 2002-05-09 | — | — | US | disclosed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | disclosed |
| EP-1193557-A1 | Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20010044075-A1 | Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element | JSR CORPORATION (JP) | 2001-11-22 | — | — | US | disclosed |
| EP-1150165-A1 | Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element | JSR Corporation (JP) | 2001-10-31 | — | — | EP | disclosed |
| EP-1057859-A2 | Radiation sensitive resin composition and use of the same in an interlaminar insulating film | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |