Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | NAAA | Q02083 | 1/20 | 0.35 |
| ▸ | FAAH | O00519 | 4/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | CNR1 | P21554 | 1/20 | 0.33 |
| ▸ | CNR2 | P34972 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | LPAR5 | Q9H1C0 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | PLA2G2C | Q5R387 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11290293 | 0.93 | TDP1 (0.58) | TDP1HSD17B10NAAAFAAHLMNA | |
| SCHEMBL443948 | 0.89 | NAAA (0.41) | TDP1HSD17B10NAAAFAAHLMNA | |
| SCHEMBL27628089 | 0.86 | TDP1 (0.53) | TDP1HSD17B10FAAHLMNACNR1 | |
| SCHEMBL12927825 | 0.86 | TDP1 (0.48) | TDP1HSD17B10FAAHLMNACNR1 | |
| SCHEMBL27646125 | 0.86 | ALDH1A1 (0.41) | TDP1HSD17B10NAAAALDH1A1CYP2C19 | |
| SCHEMBL7205921 | 0.85 | NAAA (0.52) | NAAAFAAHLMNACNR1CNR2 | |
| SCHEMBL13397846 | 0.85 | NAAA (0.41) | TDP1HSD17B10NAAAALDH1A1CYP2C19 | |
| SCHEMBL104602 | 0.83 | MEN1 (0.34) | TDP1FAAHLMNACNR1CNR2 | |
| SCHEMBL22442289 | 0.83 | TDP1 (0.53) | TDP1HSD17B10LMNACYP2C19USP2 | |
| SCHEMBL27646138 | 0.83 | TDP1 (0.38) | TDP1HSD17B10LMNAALDH1A1CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 342 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113260922-B | Positive photosensitive resin composition | 株式会社东进世美肯 | 2025-02-25 | — | — | CN | claimed |
| US-12216403-B2 | Positive photosensitive resin composition and display device using the same | DONJIN SEMICHEM CO., LTD. (KR) | 2025-02-04 | — | — | US | claimed |
| CN-110967927-B | Photosensitive resin composition and display device including the same | 三星显示有限公司 | 2025-01-28 | — | — | CN | claimed |
| US-20240118616-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2024-04-11 | — | — | US | claimed |
| CN-108572516-B | Positive photosensitive resin composition, display device and pattern forming method thereof | 株式会社东进世美肯 | 2023-10-17 | — | — | CN | claimed |
| CN-116648671-A | Negative photosensitive resin composition capable of realizing low-temperature curing and low refractive index | 株式会社东进世美肯 | 2023-08-25 | — | — | CN | claimed |
| US-20230212387-A1 | LOW-REFRACTIVE-INDEX THERMOSETTING COMPOSITION, OPTICAL MEMBER FORMED THEREFROM, AND DISPLAY DEVICE | DONGJIN SEMICHEM CO., LTD. (KR) | 2023-07-06 | — | — | US | claimed |
| CN-116057089-A | Low refractive thermosetting composition, optical member and display device using the same | 株式会社东进世美肯 | 2023-05-02 | — | — | CN | claimed |
| WO-2022145795-A1 | NEGATIVE PHOTO-SENSITIVE RESIN COMPOSITION WITH LOW-TEMPERATURE CURABILITY AND LOW REFRACTIVE INDEX | 주식회사 동진쎄미켐 | 2022-07-07 | — | — | WO | claimed |
| CN-114556216-A | Positive photosensitive resin composition and display element using the same | 株式会社东进世美肯 | 2022-05-27 | — | — | CN | claimed |
| EP-3040370-B1 | POSITIVE PHOTOSENSITIVE SILOXANE RESIN COMPOSITION AND DISPLAY DEVICE FORMED USING THE SAME | SAMSUNG DISPLAY CO LTD (KR) | 2019-02-06 | — | — | EP | claimed |
| US-9857682-B2 | Positive photosensitive siloxane resin composition and display device formed using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2018-01-02 | — | — | US | claimed |
| US-20160195810-A1 | POSITIVE PHOTOSENSITIVE SILOXANE RESIN COMPOSITION AND DISPLAY DEVICE FORMED USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-07-07 | — | — | US | claimed |
| EP-3040370-A1 | POSITIVE PHOTOSENSITIVE SILOXANE RESIN COMPOSITION AND DISPLAY DEVICE FORMED USING THE SAME | Samsung Display Co., Ltd. (KR) | 2016-07-06 | — | — | EP | claimed |
| US-8492459-B2 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2013-07-23 | — | — | US | claimed |
| US-8278021-B2 | Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-02 | — | — | US | claimed |
| US-20090176936-A1 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2009-07-09 | — | — | US | claimed |
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | claimed |
| US-6794108-B1 | COMPOUND CAPABLE OF GENERATING ACID BY ACTINIC RADIATION; POLYMER AND COMPOUND THAT DECOMPOSE TO A SULFONIC ACID; STORAGE STABILITY | FUJI PHOTO FILM CO., LTD. (JP) | 2004-09-21 | — | — | US | claimed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |