SCHEMBL4450055

SCHEMBL4450055

[c]1cccc(Sc2ccccc2)c1Sc1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIRT1 Q96EB6 1/20 0.40
MAPT P10636 4/20 0.39
KDM4E B2RXH2 2/20 0.39
NSD2 O96028 1/20 0.39
MAPK1 P28482 1/20 0.39
TUBB4A P04350 1/20 0.36
TUBB P07437 1/20 0.36
TUBA3C P0DPH7 1/20 0.36
TUBA1B P68363 1/20 0.36
TUBA4A P68366 1/20 0.36
TUBB4B P68371 1/20 0.36
TUBB3 Q13509 1/20 0.36
TUBB2A Q13885 1/20 0.36
TUBB8 Q3ZCM7 1/20 0.36
TUBA3E Q6PEY2 1/20 0.36
TUBA1A Q71U36 1/20 0.36
TUBA1C Q9BQE3 1/20 0.36
TUBB6 Q9BUF5 1/20 0.36
TUBB2B Q9BVA1 1/20 0.36
TUBB1 Q9H4B7 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16581614 0.86 MAPT (0.33) SIRT1MAPTKDM4ENSD2MAPK1
SCHEMBL16581498 0.83 IFNAR1 (0.41) SIRT1MAPTKDM4ENSD2MAPK1
SCHEMBL11136474 0.78 MAPT (0.32) MAPTMAPK1ALDH1A1HPGDSMN1; SMN2
SCHEMBL5919395 0.78 LMNA (0.35) MAPTKDM4ENSD2MAPK1CHRNA7
SCHEMBL11172355 0.78 TSHR (0.35) MAPTALDH1A1HPGDL3MBTL1SMN1; SMN2
SCHEMBL920651 0.78 SIRT1 (0.39) SIRT1MAPTKDM4ENSD2MAPK1
SCHEMBL795029 0.74 SIRT1 (0.54) SIRT1MAPTKDM4ENSD2MAPK1
SCHEMBL16581363 0.73 SIRT1 (0.43) SIRT1MAPTKDM4ENSD2MAPK1
SCHEMBL23581872 0.73 SLC6A2 (0.39) SIRT1MAPTKDM4ENSD2MAPK1
SCHEMBL4720824 0.73 CA1 (0.41) MAPTMAPK1TDP1ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2851386-B1 RESIN COMPOSITION FOR OPTICAL STEREOLITHOGRAPHY CMET INC (JP) 2017-08-16 EP disclosed
US-9416220-B2 Resin composition for optical stereolithography CMET INC. (JP) 2016-08-16 US disclosed
US-20150158971-A1 RESIN COMPOSITION FOR OPTICAL STEREOLITHOGRAPHY CMET INC. (JP) 2015-06-11 US disclosed
EP-2851386-A1 RESIN COMPOSITION FOR OPTICAL STEREOLITHOGRAPHY Cmet Inc. (JP) 2015-03-25 EP disclosed
US-7550639-B2 Process for producing olefin oligomer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-06-23 US disclosed
US-7323611-B2 Process for producing olefin oligomer SUMITOMO CHEMICAL COMPANY LIMITED (JP) 2008-01-29 US disclosed
US-20070027350-A1 PROCESS FOR PRODUCING OLEFIN OLIGOMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-01 US disclosed
US-20060293546-A1 PROCESS FOR PRODUCING OLEFIN OLIGOMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-12-28 US disclosed