SCHEMBL4452928

SCHEMBL4452928

CCCc1cc(CO)c(O)c(CO)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.50
KDM4E B2RXH2 2/20 0.47
CASP6 P55212 1/20 0.47
CNR1 P21554 1/20 0.42
CNR2 P34972 1/20 0.42
PTGS2 P35354 3/20 0.39
CYP3A4 P08684 1/20 0.39
HPGD P15428 2/20 0.38
HTT P42858 2/20 0.38
NPC1 O15118 1/20 0.38
MAPK1 P28482 1/20 0.38
RAB9A P51151 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
ALOX5 P09917 1/20 0.37
DHFR P00374 1/20 0.36
GABRA1 P14867 3/20 0.36
GABRB2 P47870 3/20 0.36
GABRA5 P31644 1/20 0.36
GABRA3 P34903 1/20 0.36
GABRA2 P47869 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28429147 0.88 SHBG (0.69) SHBGKDM4ECASP6CNR1CNR2
SCHEMBL4458958 0.87 NPC1 (0.53) SHBGKDM4ECASP6PTGS2CYP3A4
SCHEMBL1023215 0.86 DHFR (0.45) CNR1CNR2PTGS2CYP3A4HPGD
SCHEMBL10743673 0.85 PTGS2 (0.59) SHBGKDM4ECASP6PTGS2CYP3A4
SCHEMBL9999532 0.85 SHBG (0.46) SHBGKDM4ECASP6CNR1CNR2
SCHEMBL1023550 0.84 DHFR (0.47) CNR1CNR2PTGS2CYP3A4HPGD
SCHEMBL5517875 0.84 PTGS2 (0.60) SHBGKDM4EPTGS2CYP3A4HPGD
SCHEMBL10780711 0.84 PTGS2 (0.60) SHBGKDM4EPTGS2CYP3A4HPGD
SCHEMBL9813650 0.84 PTGS2 (0.60) SHBGKDM4EPTGS2CYP3A4HPGD
SCHEMBL10782524 0.84 PTGS2 (0.60) SHBGKDM4EPTGS2CYP3A4HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 147 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112010737-B Synthetic method of 2, 2-bis (4-hydroxy-3, 5-dimethylphenyl) propane 南京法恩化学有限公司 2022-03-29 CN claimed
CN-112010737-A Synthetic method of 2, 2-bis (4-hydroxy-3, 5-dimethylphenyl) propane 南京法恩化学有限公司 2020-12-01 CN claimed
US-20240329525-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-10-03 US disclosed
CN-118355319-A Liquid crystal aligning agent, liquid crystal alignment film, liquid crystal display element, and compound 日产化学株式会社 2024-07-16 CN disclosed
CN-118339509-A Liquid crystal aligning agent and liquid crystal display element 日产化学株式会社 2024-07-12 CN disclosed
US-20240210827-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-06-27 US disclosed
CN-118244543-A Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 日产化学株式会社 2024-06-25 CN disclosed
CN-107533259-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学工业株式会社 2024-06-21 CN disclosed
CN-118056157-A Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 日产化学株式会社 2024-05-17 CN disclosed
CN-118043732-A Weak anchoring liquid crystal aligning agent, liquid crystal display element and polymer 日产化学株式会社 2024-05-14 CN disclosed
CN-118027990-A Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 日产化学株式会社 2024-05-14 CN disclosed
EP-1637337-A1 DEVELOPER FOR RECORDING MATERIALS Asahi Kasei Chemicals Corporation (JP) 2006-03-22 EP disclosed
CN-1428358-A Aqueous alkali-soluble resin, photosensitive resin composition, photomask, and method for producing electronic device HITACHI LTD (JP) 2003-07-09 CN disclosed
EP-0032062-B2 HIGH-MOLECULAR-WEIGHT NOVOLAK SUBSTITUTED PHENOLIC RESINS AND THEIR PREPARATION MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1991-10-16 EP disclosed
EP-0117759-B1 POLYNUCLEAR POLYHYDRIC PHENOLS AND PROCESS FOR PREPARATION THEREOF MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1987-09-30 EP disclosed
US-4614826-A CURABLE TO EPOXY RESINS; HEAT RESISTANCE MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1986-09-30 US disclosed
EP-0032062-B1 HIGH-MOLECULAR-WEIGHT NOVOLAK SUBSTITUTED PHENOLIC RESINS AND THEIR PREPARATION MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1985-04-03 EP disclosed
EP-0117759-A1 Polynuclear polyhydric phenols and process for preparation thereof MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1984-09-05 EP disclosed
US-4345054-A High-molecular-weight novolak types substituted phenolic resins and process for preparation thereof MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1982-08-17 US disclosed
EP-0032062-A2 High-molecular-weight novolak substituted phenolic resins and their preparation MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1981-07-15 EP disclosed