Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.61 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.59 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.59 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.59 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.55 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | GAA | P10253 | 2/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | SHBG | P04278 | 1/20 | 0.47 |
| ▸ | SELL | P14151 | 1/20 | 0.40 |
| ▸ | SELP | P16109 | 1/20 | 0.40 |
| ▸ | SELE | P16581 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | ESR1 | P03372 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15105759 | 1.00 | AMY1A (0.61) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL30669854 | 1.00 | AMY1A (0.61) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL30374837 | 1.00 | AMY1A (0.61) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL69707 | 0.98 | AMY1A (0.57) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL8733376 | 0.92 | SHBG (0.60) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL17278917 | 0.90 | AMY1A (0.52) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL12786466 | 0.90 | CYP2C9 (0.52) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL30898482 | 0.90 | CYP2C9 (0.52) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL19421993 | 0.88 | AMY1A (0.50) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL31612187 | 0.87 | SHBG (0.66) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 214 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9562124-B2 | Thermo-oxidatively stable, side chain polyether functionalized polynorbornenes for microelectronic and optoelectronic devices and assemblies thereof | PROMERUS, LLC (US) | 2017-02-07 | — | — | US | claimed |
| US-20160319060-A1 | Thermo-oxidatively Stable, Side Chain Polyether Functionalized Polynorbornenes for Microelectronic and Optoelectronic Devices and Assemblies Thereof | PROMERUS, LLC (US) | 2016-11-03 | — | — | US | claimed |
| US-12590950-B2 | Methods for predicting ER-mediated DNA damage | UNIVERSITY OF MASSACHUSETTS (US) | 2026-03-31 | — | — | US | disclosed |
| US-20250376552-A1 | RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250264801-A1 | RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-08-21 | — | — | US | disclosed |
| EP-4596607-A1 | RESIN COMPOSITION, CURED OBJECT, LAYERED PRODUCT, METHOD FOR PRODUCING CURED OBJECT, METHOD FOR PRODUCING LAYERED PRODUCT, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| EP-4596608-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| EP-4597225-A1 | FILM PRODUCTION METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT PRODUCTION METHOD, CURED PRODUCT, AND LAMINATE | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| US-20250236697-A1 | RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-07-24 | — | — | US | disclosed |
| US-20250230283-A1 | RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-07-17 | — | — | US | disclosed |
| WO-2024185652-A1 | RESIN COMPOSITION, CURED PRODUCT, MULTILAYER BODY, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING MULTILAYER BODY, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | 富士フイルム株式会社 | 2024-09-12 | — | — | WO | disclosed |
| EP-0684521-A1 | Positive working photosensitive compositions | FUJI PHOTO FILM CO., LTD. (JP) | 1995-11-29 | — | — | EP | disclosed |
| EP-0677789-A1 | Positive photoresist composition | Fuji Photo Film Co., Ltd. (JP) | 1995-10-18 | — | — | EP | disclosed |
| EP-0672952-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-09-20 | — | — | EP | disclosed |
| EP-0658807-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-06-21 | — | — | EP | disclosed |
| US-5407779-A | A phenolic resin and photoinitiator comprising the esters of quinonediazidesulfonic acid and a poly/alkylhydroxyphenylalkyl/biphenol; resolution, profil and depth of focus | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-04-18 | — | — | US | disclosed |
| US-5407778-A | A phenolic resin and photoinitiator comprising the esters of quinonediazidesulfonic acid and a bis/methylhydroxyphenylmethyl/phenol; resolution, profile and depth of focus | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-04-18 | — | — | US | disclosed |
| EP-0644460-A1 | Positive working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-03-22 | — | — | EP | disclosed |
| EP-0573056-A2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-12-08 | — | — | EP | disclosed |
| EP-0570884-A2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-11-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12590950-B2 | Methods for predicting ER-mediated DNA damage | ESR1, ESR2, ESRRA | AMY1A 2797/4885CYP2C9 480/4885CYP2C19 321/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.