SCHEMBL8733376

SCHEMBL8733376

Cc1cc(C)c(O)c(Cc2cc(C)cc(CO)c2O)c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.60
AMY1A P0DUB6 1/20 0.53
CYP2C9 P11712 3/20 0.52
CYP2C19 P33261 3/20 0.52
HIF1A Q16665 3/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
HSPA5 P11021 1/20 0.48
HSD17B10 Q99714 2/20 0.46
CYP2D6 P10635 1/20 0.46
KDM4E B2RXH2 3/20 0.42
LMNA P02545 2/20 0.42
GAA P10253 2/20 0.42
ALDH1A1 P00352 2/20 0.42
MAPT P10636 1/20 0.42
HTT P42858 1/20 0.35
SELL P14151 1/20 0.34
SELP P16109 1/20 0.34
SELE P16581 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15105759 0.92 AMY1A (0.61) SHBGAMY1ACYP2C9CYP2C19HIF1A
SCHEMBL30558172 0.92 SHBG (0.63) SHBGAMY1ACYP2C9CYP2C19HIF1A
SCHEMBL30669854 0.92 AMY1A (0.61) SHBGAMY1ACYP2C9CYP2C19HIF1A
SCHEMBL1482608 0.92 AMY1A (0.61) SHBGAMY1ACYP2C9CYP2C19HIF1A
SCHEMBL4456468 0.92 AMY1A (0.61) SHBGAMY1ACYP2C9CYP2C19HIF1A
SCHEMBL29400422 0.92 AMY1A (0.61) SHBGAMY1ACYP2C9CYP2C19HIF1A
SCHEMBL210506 0.92 AMY1A (0.61) SHBGAMY1ACYP2C9CYP2C19HIF1A
SCHEMBL30374837 0.92 AMY1A (0.61) SHBGAMY1ACYP2C9CYP2C19HIF1A
SCHEMBL866775 0.92 SHBG (0.63) SHBGAMY1ACYP2C9CYP2C19HIF1A
SCHEMBL69707 0.89 AMY1A (0.57) SHBGAMY1ACYP2C9CYP2C19HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023084961-A1 CHEMICAL-RESISTANT PROTECTIVE FILM 日産化学株式会社 2023-05-19 WO disclosed
US-20230143007-A1 MULTILAYER OBJECT AND RELEASE AGENT COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-05-11 US disclosed
EP-3498788-B1 SOLDER MASK INKJET INKS FOR MANUFACTURING PRINTED CIRCUIT BOARDS AGFA GEVAERT NV (BE) 2023-05-03 EP disclosed
EP-3656824-A1 RADIATION CURABLE INKJET FOR MANUFACTURING PRINTED CIRCUIT BOARDS AGFA-GEVAERT NV (BE) 2020-05-27 EP disclosed
EP-0686274-B1 NOVEL MATRIX RESIN FOR HIGH-TEMPERATURE STABLE PHOTOIMAGEABLE COMPOSITIONS CLARIANT FINANCE BVI LTD (VG) 1998-12-23 EP disclosed
US-5510420-A NUCLEOPHILIC GRAFTING OF PARENT POLYMER HAVING AROMATIC RINGS CONTAINING REACTIVE GROUPS HOECHST CELANESE CORPORATION (US) 1996-04-23 US disclosed
EP-0686274-A1 NOVEL MATRIX RESIN FOR HIGH-TEMPERATURE STABLE PHOTOIMAGEABLE COMPOSITIONS HOECHST CELANESE CORPORATION (US) 1995-12-13 EP disclosed
WO-1994019724-A1 NOVEL MATRIX RESIN FOR HIGH-TEMPERATURE STABLE PHOTOIMAGEABLE COMPOSITIONS HOECHST CELANESE CORPORATION (US) 1994-09-01 WO disclosed