Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Propylene Glycol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | FFAR3 | O14843 | 2/20 | 0.42 |
| ▸ | USP2 | O75604 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.32 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.32 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.32 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.31 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.31 |
| ▸ | GPR84 | Q9NQS5 | 3/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylene Glycol SCHEMBL122754 | 0.89 | HSD17B10 (0.52) | HSD17B10TDP1USP2MEN1KMT2A | |
| Propylene Glycol SCHEMBL443949 | 0.88 | TSHR (0.48) | HSD17B10TDP1FFAR3USP2MEN1 | |
| Propylene Glycol SCHEMBL10765776 | 0.87 | HSD17B10 (0.64) | HSD17B10TDP1USP2MEN1KMT2A | |
| Propylene Glycol SCHEMBL56047 | 0.87 | HSD17B10 (0.64) | HSD17B10TDP1USP2MEN1KMT2A | |
| Propylene Glycol SCHEMBL3736319 | 0.86 | HSD17B10 (0.48) | HSD17B10TDP1FFAR3USP2TSHR | |
| Propylene Glycol SCHEMBL8961548 | 0.85 | USP2 (0.53) | USP2MEN1KMT2AMAPTGPR84 | |
| Propylene Glycol SCHEMBL28092305 | 0.84 | HSD17B10 (0.61) | HSD17B10TDP1USP2MEN1KMT2A | |
| Propylene Glycol SCHEMBL10613711 | 0.84 | HSD17B10 (0.61) | HSD17B10TDP1USP2MEN1KMT2A | |
| Propylene Glycol SCHEMBL1490297 | 0.84 | TDP1 (0.59) | TDP1FFAR3TSHRHDAC3HDAC1 | |
| Propionic Acid SCHEMBL11838203 | 0.84 | FFAR3 (0.59) | HSD17B10TDP1FFAR3MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 247 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113260922-B | Positive photosensitive resin composition | 株式会社东进世美肯 | 2025-02-25 | — | — | CN | claimed |
| US-12216403-B2 | Positive photosensitive resin composition and display device using the same | DONJIN SEMICHEM CO., LTD. (KR) | 2025-02-04 | — | — | US | claimed |
| CN-110967927-B | Photosensitive resin composition and display device including the same | 三星显示有限公司 | 2025-01-28 | — | — | CN | claimed |
| US-20240118616-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2024-04-11 | — | — | US | claimed |
| CN-108572516-B | Positive photosensitive resin composition, display device and pattern forming method thereof | 株式会社东进世美肯 | 2023-10-17 | — | — | CN | claimed |
| CN-116648671-A | Negative photosensitive resin composition capable of realizing low-temperature curing and low refractive index | 株式会社东进世美肯 | 2023-08-25 | — | — | CN | claimed |
| CN-116057089-A | Low refractive thermosetting composition, optical member and display device using the same | 株式会社东进世美肯 | 2023-05-02 | — | — | CN | claimed |
| WO-2022145795-A1 | NEGATIVE PHOTO-SENSITIVE RESIN COMPOSITION WITH LOW-TEMPERATURE CURABILITY AND LOW REFRACTIVE INDEX | 주식회사 동진쎄미켐 | 2022-07-07 | — | — | WO | claimed |
| CN-114556216-A | Positive photosensitive resin composition and display element using the same | 株式会社东进世美肯 | 2022-05-27 | — | — | CN | claimed |
| CN-113260922-A | Positive photosensitive resin composition | 株式会社东进世美肯 | 2021-08-13 | — | — | CN | claimed |
| US-10982061-B2 | Photosensitive resin composition and display device including the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2021-04-20 | — | — | US | claimed |
| CN-105759568-B | Positive photosensitive siloxane resin composition and display device formed using the same | 三星显示有限公司 | 2021-03-19 | — | — | CN | claimed |
| CN-111123644-A | Photosensitive resin composition, display, and method for forming pattern of display | 株式会社东进世美肯 | 2020-05-08 | — | — | CN | claimed |
| CN-110967927-A | Photosensitive resin composition and display device including the same | 三星显示有限公司 | 2020-04-07 | — | — | CN | claimed |
| US-20200102433-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE INCLUDING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2020-04-02 | — | — | US | claimed |
| US-8492459-B2 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2013-07-23 | — | — | US | claimed |
| US-20090176936-A1 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2009-07-09 | — | — | US | claimed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |
| US-20250280668-A1 | DISPLAY DEVICE | LG DISPLAY CO., LTD. (KR) | 2025-09-04 | — | — | US | disclosed |
| EP-1057859-A2 | Radiation sensitive resin composition and use of the same in an interlaminar insulating film | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |