SCHEMBL4461870

SCHEMBL4461870

C=CC(=O)OCCSc1ccc(Sc2ccc(SCCOC(=O)C=C)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 3/20 0.47
ALDH1A1 P00352 7/20 0.47
TSHR P16473 6/20 0.47
TP53 P04637 3/20 0.47
HIF1A Q16665 3/20 0.47
CYP3A4 P08684 2/20 0.47
HSD17B10 Q99714 1/20 0.47
HPGD P15428 3/20 0.43
KDM4E B2RXH2 1/20 0.39
PKM P14618 1/20 0.36
HTT P42858 1/20 0.36
SMN1; SMN2 Q16637 2/20 0.35
MAPK1 P28482 1/20 0.35
LMNA P02545 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
MTNR1A P48039 1/20 0.34
MTNR1B P49286 1/20 0.34
RAB9A P51151 1/20 0.34
MEN1 O00255 1/20 0.33
MAPT P10636 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29311777 0.96 ALDH1A1 (0.50) THRBALDH1A1TSHRTP53HIF1A
SCHEMBL25118345 0.90 TSHR (0.59) THRBALDH1A1TSHRTP53HIF1A
SCHEMBL25118383 0.90 TSHR (0.59) THRBALDH1A1TSHRTP53HIF1A
SCHEMBL10455358 0.88 THRB (0.44) THRBALDH1A1TSHRTP53HIF1A
SCHEMBL556653 0.88 THRB (0.44) THRBALDH1A1TSHRTP53HIF1A
SCHEMBL1710063 0.88 HPGD (0.48) THRBALDH1A1TSHRTP53HIF1A
SCHEMBL7524595 0.88 KDM4E (0.51) THRBALDH1A1TSHRTP53HIF1A
SCHEMBL42562 0.88 THRB (0.58) THRBALDH1A1TSHRTP53HIF1A
SCHEMBL24565139 0.85 MTNR1A (0.52) THRBALDH1A1TSHRTP53HIF1A
SCHEMBL20647910 0.85 THRB (0.49) THRBALDH1A1TSHRTP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1831728-B1 DISPLAYS HAVING A HIGH REFRACTIVE INDEX, DURABLE HARDCOAT LAYER 3M INNOVATIVE PROPERTIES CO (US) 2009-07-29 EP claimed
US-11543584-B2 Inorganic matrix nanoimprint lithographs and methods of making thereof with reduced carbon META PLATFORMS TECHNOLOGIES, LLC (US) 2023-01-03 US disclosed
WO-2022147180-A1 HIGH REFRACTIVE INDEX OVERCOAT FORMULATION AND METHOD OF USE WITH INKJET PRINTING META PLATFORMS TECHNOLOGIES, LLC (US) 2022-07-07 WO disclosed
US-20220204790-A1 HIGH REFRACTIVE INDEX OVERCOAT FORMULATION AND METHOD OF USE WITH INKJET PRINTING META PLATFORMS TECHNOLOGIES, LLC 2022-06-30 US disclosed
US-20220019015-A1 INORGANIC MATRIX NANOIMPRINT LITHOGRAPHS AND METHODS OF MAKING THEREOF META PLATFORMS TECHNOLOGIES, LLC 2022-01-20 US disclosed
EP-3940456-A1 NANOIMPRINT LITHOGRAPHY GRATING AND OPTICAL COMPONENT COMPRISING SUCH GRATING Facebook Technologies, LLC (US) 2022-01-19 EP disclosed
US-20210061935-A1 CURABLE HIGH REFRACTIVE INDEX COMPOSITIONS AND ARTICLES PREPARED FROM THEM 3M INNOVATIVE PROPERTIES COMPANY 2021-03-04 US disclosed
WO-2020163334-A1 CURABLE FORMULATION WITH HIGH REFRACTIVE INDEX AND ITS APPLICATION IN SURFACE RELIEF GRATING USING NANOIMPRINTING LITHOGRAPHY FACEBOOK TECHNOLOGIES, LLC (US) 2020-08-13 WO disclosed
US-20200249568-A1 CURABLE FORMULATION WITH HIGH REFRACTIVE INDEX AND ITS APPLICATION IN SURFACE RELIEF GRATING USING NANOIMPRINTING LITHOGRAPHY META PLATFORMS TECHNOLOGIES, LLC 2020-08-06 US disclosed
US-8124194-B2 Ink composition comprising a compound with a sulfide bond and an ink jet recording method FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090136678-A1 Ink composition and ink jet recording method FUJIFILM CORPORATION (JP) 2009-05-28 US disclosed
US-7491441-B2 High refractive index, durable hard coats 3M INNOVATIVE PROPERTIES COMPANY (US) 2009-02-17 US disclosed
US-7491441-B2 High refractive index, durable hard coats 3M INNOVATIVE PROPERTIES COMPANY (US) 2009-02-17 US disclosed
US-7312290-B2 Curable formulations, cured compositions, and articles derived thereform GENERAL ELECTRIC COMPANY (US) 2007-12-25 US disclosed
EP-0795765-B1 Photopolymerizable composition and transparent cured product thereof TOKUYAMA CORP (JP) 2002-09-25 EP disclosed
US-5880170-A TRANSPARENT LENSES FORMED BY CURING TOKUYAMA CORPORATION (JP) 1999-03-09 US disclosed
EP-0795765-A2 Photopolymerizable composition and transparent cured product thereof TOKUYAMA CORPORATION (JP) 1997-09-17 EP disclosed
EP-0482572-B1 Resin for high-refraction lens MITSUBISHI PETROCHEMICAL CO (JP) 1994-08-03 EP disclosed
US-5191061-A High impact, radiation transparent plastic for lenses Misubishi Petrochemical Co., Ltd. (JP) 1993-03-02 US disclosed
EP-0482572-A1 Resin for high-refraction lens MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1992-04-29 EP disclosed