SCHEMBL4472225

SCHEMBL4472225

[CH2]C(O)C(O)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.52
ADRA2C P18825 2/20 0.52
KDM4E B2RXH2 2/20 0.52
ADRA2A P08913 1/20 0.52
HIF1A Q16665 1/20 0.52
ALDH1A1 P00352 3/20 0.50
AOC3 Q16853 6/20 0.48
CHRM2 P08172 1/20 0.48
ADRA1A P35348 1/20 0.48
RGS12 O14924 1/20 0.48
GLA P06280 1/20 0.48
CYP3A4 P08684 1/20 0.48
CYP2D6 P10635 1/20 0.48
CYP2C9 P11712 1/20 0.48
PKM P14618 1/20 0.48
ALOX15 P16050 1/20 0.48
TSHR P16473 1/20 0.48
ALOX12 P18054 1/20 0.48
NFKB1 P19838 1/20 0.48
HTR2A P28223 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2889714 0.82 LMNA (0.62) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL1711563 0.82 LMNA (0.62) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL430516 0.82 LMNA (0.62) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL1417856 0.82 LMNA (0.62) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL915218 0.82 LMNA (0.62) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL3055513 0.82 LMNA (0.62) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL29674753 0.82 LMNA (0.62) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL6199592 0.79 KDM4E (0.60) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL7960004 0.78 LMNA (0.44) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL14474285 0.77 LMNA (0.56) LMNAADRA2CKDM4EADRA2AHIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10141084-B2 Electronic device CHEIL INDUSTRIES, INC. (KR) 2018-11-27 US disclosed
US-9814656-B2 Porous resin particles, method of manufacturing porous resin particles, and use of porous resin particles SEKISUI PLASTICS CO., LTD. (JP) 2017-11-14 US disclosed
EP-3186226-A1 OXIME SULFONATE DERIVATIVES BASF SE (DE) 2017-07-05 EP disclosed
EP-2813519-B1 POROUS RESIN PARTICLES, METHOD FOR PRODUCING POROUS RESIN PARTICLES, AND USE OF POROUS RESIN PARTICLES SEKISUI PLASTICS (JP) 2016-07-20 EP disclosed
WO-2016030790-A1 OXIME SULFONATE DERIVATIVES BASF SE (DE) 2016-03-03 WO disclosed
US-20150030842-A1 POROUS RESIN PARTICLES, METHOD OF MANUFACTURING POROUS RESIN PARTICLES, AND USE OF POROUS RESIN PARTICLES SEKISUI PLASTICS CO., LTD. (JP) 2015-01-29 US disclosed
EP-2813519-A1 POROUS RESIN PARTICLES, METHOD FOR PRODUCING POROUS RESIN PARTICLES, AND USE OF POROUS RESIN PARTICLES Sekisui Plastics Co., Ltd. (JP) 2014-12-17 EP disclosed
WO-2009108056-A1 OPTICAL FIBER TAPE WITH EPOXY MODIFIED SILICONE ADDITIVE DSM IP ASSETS B.V. (NL) 2009-09-03 WO disclosed
EP-1797149-A1 CURABLE LIQUID RESIN OPTICAL FIBER UPJACKET COMPOSITION DSMIP Assets B.V. (NL) 2007-06-20 EP disclosed
CN-1922221-A Active energy ray-curable composition for optical material TOAGOSEI CO LTD (JP) 2007-02-28 CN disclosed
WO-2006025734-A1 CURABLE LIQUID RESIN OPTICAL FIBER UPJACKET COMPOSITION DSM IP ASSETS B.V. (NL) 2006-03-09 WO disclosed
CN-1125143-C Ionizing radiation curable resin composition for fresnel lens and transmission screen DAINIPPON PRINTING CO LTD (JP) 2003-10-22 CN disclosed
CN-1230572-A Ionizing radiation curable resin composition for fresnel lens and transmission screen DAINIPPON PRINTING CO LTD (JP) 1999-10-06 CN disclosed