SCHEMBL447452

SCHEMBL447452

CO[Si](OC)(OC)C(CCNCCN)Cc1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.40
KCNH2 Q12809 2/20 0.38
MMP2 P08253 2/20 0.36
SIGMAR1 Q99720 5/20 0.35
SLC6A2 P23975 2/20 0.35
TAAR1 Q96RJ0 2/20 0.35
MAOA P21397 1/20 0.35
SLC6A4 P31645 1/20 0.35
SLC6A3 Q01959 1/20 0.35
ANPEP P15144 1/20 0.35
CYP2A6 P11509 1/20 0.35
ADORA2A P29274 1/20 0.35
ADORA1 P30542 1/20 0.35
CHRNB2 P17787 1/20 0.35
CHRNB4 P30926 1/20 0.35
CHRNA3 P32297 1/20 0.35
CHRNA4 P43681 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Heptane SCHEMBL28860811 0.92 CSNK1E (0.41) ALDH1A1SIGMAR1CHRNB2CHRNB4CHRNA3
SCHEMBL37759 0.87 ALDH1A1 (0.38) ALDH1A1MMP2SIGMAR1SLC6A2TAAR1
SCHEMBL614445 0.85 ALDH1A1 (0.49) ALDH1A1SIGMAR1SLC6A2TAAR1MAOA
Hydrochloric Acid SCHEMBL28254831 0.84 HTT (0.44) KCNH2SIGMAR1SLC6A2TAAR1SLC6A4
SCHEMBL516374 0.80 MEN1 (0.44) SIGMAR1MAOA
SCHEMBL366500 0.80 CHRNB2 (0.35) MMP2SIGMAR1CHRNB2CHRNB4CHRNA3
Hydrochloric Acid SCHEMBL5971835 0.79 MEN1 (0.43) SIGMAR1MAOA
SCHEMBL367238 0.78 CHRNB2 (0.38) MMP2SIGMAR1CHRNB2CHRNB4CHRNA3
Ethylene SCHEMBL27558649 0.78 MEN1 (0.42) SIGMAR1MAOA
SCHEMBL16597964 0.78 TAAR1 (0.38) ALDH1A1MMP2SIGMAR1SLC6A2TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4869964-A Oxidation resistant compositions for use with rare earth magnets THE B. F. GOODRICH COMPANY (US) 1989-09-26 US claimed
WO-2025005084-A1 SUBSTRATE LAMINATE 三井化学株式会社 2025-01-02 WO disclosed
WO-2024172044-A1 METHOD FOR MANUFACTURING SUBSTRATE LAYERED BODY, LAYERED BODY, AND SUBSTRATE LAYERED BODY 三井化学株式会社 2024-08-22 WO disclosed
WO-2024162446-A1 SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SAME 三井化学株式会社 2024-08-08 WO disclosed
US-11965109-B2 Semiconductor film composition, method for manufacturing semiconductor film composition, method for manufacturing semiconductor member, method for manufacturing semiconductor processing material, and semiconductor device MITSUI CHEMICALS, INC. (JP) 2024-04-23 US disclosed
WO-2024029390-A1 METHOD FOR PRODUCING SUBSTRATE LAMINATE AND SEMICONDUCTOR DEVICE 三井化学株式会社 2024-02-08 WO disclosed
US-20240026219-A1 LIGHT-EMITTING PARTICLES AND METHOD FOR PRODUCING THE SAME, LIGHT-EMITTING PARTICLE DISPERSION, LIGHT CONVERSION FILM, LAMINATE, LIGHT CONVERSION LAYER, COLOR FILTER, AND LIGHT-EMITTING ELEMENT DIC CORPORATION (JP) 2024-01-25 US disclosed
WO-2024010007-A1 SUBSTRATE LAYERED BODY MANUFACTURING METHOD AND SUBSTRATE LAYERED BODY 三井化学株式会社 2024-01-11 WO disclosed
US-11859110-B2 Substrate laminated body and method of manufacturing substrate laminated body MITSUI CHEMICALS, INC. (JP) 2024-01-02 US disclosed
EP-3616903-B1 SUBSTRATE LAMINATED BODY AND METHOD FOR MANUFACTURING SUBSTRATE LAMINATED BODY MITSUI CHEMICALS INC (JP) 2023-09-27 EP disclosed
EP-2614118-B1 SILICON DIOXIDE DISPERSIONS BASF SE (DE) 2015-11-25 EP disclosed
US-8901186-B2 Process for producing silica-comprising dispersions comprising polyetherols or polyether amines BASF SE (DE) 2014-12-02 US disclosed
EP-2614118-A1 SILICON DIOXIDE DISPERSIONS BASF SE (DE) 2013-07-17 EP disclosed
EP-2337806-B1 METHOD FOR PRODUCING POLYOL DISPERSIONS CONTAINING SILICA BASF SE (DE) 2013-03-27 EP disclosed
US-20120065341-A1 SILICON DIOXIDE DISPERSIONS BASF SE (DE) 2012-03-15 US disclosed
WO-2012032099-A1 SILICON DIOXIDE DISPERSIONS BASF SE (DE) 2012-03-15 WO disclosed
US-20110313070-A1 PROCESS FOR PRODUCING SILICA-COMPRISING DISPERSIONS COMPRISING POLYETHEROLS OR POLYETHER AMINES BASF SE (DE) 2011-12-22 US disclosed
US-20110266497-A1 PROCESS FOR PRODUCING SILICA-COMPRISING POLYOL DISPERSIONS AND THEIR USE FOR PRODUCING POLYURETHANE MATERIALS BASF SE (DE) 2011-11-03 US disclosed
US-20060004121-A1 Polymer-brush modified fillers for composites REGENTS OF THE UNIVERSITY OF COLORADO, THE 2006-01-05 US disclosed
US-4689422-A Novel ligand catalyst systems formed by reaction of carbonyl compounds with organosilicon compounds TEXACO INC. (US) 1987-08-25 US disclosed