Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 5/20 | 0.36 |
| ▸ | ADRA1A | P35348 | 2/20 | 0.36 |
| ▸ | USP2 | O75604 | 2/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.36 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | CNR1 | P21554 | 1/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.36 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.36 |
| ▸ | HTR2A | P28223 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6063978 | 0.80 | TSHR (0.48) | TSHRMEN1KMT2AALDH1A1LMNA | |
| SCHEMBL2478389 | 0.80 | TSHR (0.48) | TSHRMEN1KMT2AALDH1A1LMNA | |
| SCHEMBL20564587 | 0.80 | TSHR (0.48) | TSHRMEN1KMT2AALDH1A1LMNA | |
| SCHEMBL23292873 | 0.79 | TSHR (0.41) | TSHRALDH1A1PRKCA | |
| SCHEMBL4675881 | 0.78 | TSHR (0.46) | TSHRMEN1KMT2AALDH1A1LMNA | |
| SCHEMBL4675760 | 0.78 | TSHR (0.46) | TSHRMEN1KMT2AALDH1A1LMNA | |
| SCHEMBL29278965 | 0.77 | ALDH1A1 (0.33) | TSHRALDH1A1PRKCA | |
| SCHEMBL8947297 | 0.77 | ALDH1A1 (0.39) | TSHRKMT2AALDH1A1CYP1A2MAPT | |
| SCHEMBL21060855 | 0.77 | TSHR (0.58) | TSHRMEN1KMT2AALDH1A1CYP1A2 | |
| SCHEMBL131879 | 0.76 | TSHR (0.43) | TSHRMEN1KMT2ALMNAADRA1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 281 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025105354-A1 | COMPOSITION FOR SEMICONDUCTOR PRODUCTION | 三菱瓦斯化学株式会社 | 2025-05-22 | — | — | WO | claimed |
| CN-110874025-B | Diluent composition, substrate processing method and semiconductor element manufacturing method | 易案爱富科技有限公司 | 2024-05-24 | — | — | CN | claimed |
| US-11220659-B2 | Thinner composition | ENF TECHNOLOGY CO., LTD. (KR) | 2022-01-11 | — | — | US | claimed |
| CN-110874025-A | Thinner composition, substrate processing method and semiconductor device manufacturing method | 易案爱富科技有限公司 | 2020-03-10 | — | — | CN | claimed |
| US-20200071640-A1 | THINNER COMPOSITION | ENF TECHNOLOGY CO., LTD. (KR) | 2020-03-05 | — | — | US | claimed |
| US-9568830-B2 | Thinner composition for improving coating and removing performance of resist | DONGWOO FINE-CHEM CO., LTD. (KR) | 2017-02-14 | — | — | US | claimed |
| US-20150355545-A1 | THINNER COMPOSITION FOR IMPROVING COATING AND REMOVING PERFORMANCE OF RESIST | DONGWOO FINE-CHEM CO., LTD. (KR) | 2015-12-10 | — | — | US | claimed |
| WO-2006119283-A2 | ANTI-ODOR COMPOSITIONS AND THERAPEUTIC USE | YU RUEY J (US) | 2006-11-09 | — | — | WO | claimed |
| US-20060251597-A1 | ANTI-ODOR COMPOSITIONS AND THERAPEUTIC USE | YU RUEY J | 2006-11-09 | — | — | US | claimed |
| EP-1016698-B1 | Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks | MITSUBISHI RAYON CO (JP) | 2004-09-22 | — | — | EP | claimed |
| EP-1016699-A1 | Use of a solvent composition comprising an oxyisobutyric acid ester as a cleaning agent | Mitsubishi Rayon Co., Ltd. (JP) | 2000-07-05 | — | — | EP | claimed |
| EP-1016698-A1 | Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks | Mitsubishi Rayon Co., Ltd. (JP) | 2000-07-05 | — | — | EP | claimed |
| US-5612303-A | HYDROXY OR ETHERIFIED ESTERS | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1997-03-18 | — | — | US | claimed |
| EP-0629671-A2 | Solvent composition | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-12-21 | — | — | EP | claimed |
| US-20260140442-A1 | RADIATION SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2026-05-21 | — | — | US | disclosed |
| WO-2026100524-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, ONIUM SALT COMPOUND, AND POLYMER | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100258-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| EP-0629671-A2 | Solvent composition | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-12-21 | — | — | EP | disclosed |
| EP-0448797-A2 | Process for producing alpha-hydroxyisobutyric acid | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1991-10-02 | — | — | EP | disclosed |
| US-5053535-A | Process for producing α-hydroxyisobutyric acid | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1991-10-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260140442-A1 | RADIATION SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | RER1, RAD51, RFT1 | TSHR 2250/4885MEN1 2082/4885KMT2A 2631/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.