⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10453989 | 0.83 | DNM1 (0.31) | — | |
| SCHEMBL10528127 | 0.82 | — | — | |
| SCHEMBL10454127 | 0.76 | — | — | |
| SCHEMBL2484592 | 0.74 | — | — | |
| SCHEMBL23581514 | 0.73 | HSD17B10 (0.33) | — | |
| SCHEMBL9878979 | 0.73 | — | — | |
| SCHEMBL448093 | 0.71 | LMNA (0.39) | — | |
| SCHEMBL15966008 | 0.70 | HSD17B10 (0.33) | — | |
| SCHEMBL3629253 | 0.70 | — | — | |
| SCHEMBL3629249 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8158546-B2 | Transparent aqua-based nano sol-gel composition and method of applying the same | ONID TECHNOLOGY (SHANGHAI) CORP. (CN) | 2012-04-17 | — | — | US | claimed |
| US-20090123647-A1 | TRANSPARENT AQUA-BASED NANO SOL-GEL COMPOSITION AND METHOD OF APPLYING THE SAME | ONID TECHNOLOGY (SHANGHAI) CORP. (CN) | 2009-05-14 | — | — | US | claimed |
| US-20250129215-A1 | (POLY)SILSESQUIOXANE-FORMING COMPOSITE COMPOSITION | ROBERT BOSCH GMBH (DE) | 2025-04-24 | — | — | US | disclosed |
| WO-2024176969-A1 | METHOD FOR PRODUCING CARBONIC ACID DIESTER | 国立研究開発法人産業技術総合研究所 | 2024-08-29 | — | — | WO | disclosed |
| EP-4409608-A1 | (POLY)SILSESQUIOXANE-FORMING COMPOSITE COMPOSITION | Robert Bosch GmbH (DE) | 2024-08-07 | — | — | EP | disclosed |
| WO-2023046995-A1 | (POLY)SILSESQUIOXANE-FORMING COMPOSITE COMPOSITION | ROBERT BOSCH GMBH (DE) | 2023-03-30 | — | — | WO | disclosed |
| US-20230087596-A1 | ESTER COMPOUND, METHOD FOR PRODUCING SAME, POLYMER, THERMOSETTING RESIN COMPOSITION AND CURED FILM | KYOEISHA CHEMICAL CO., LTD. (JP) | 2023-03-23 | — | — | US | disclosed |
| WO-2022210869-A1 | METHOD FOR PRODUCING SEMI-CURED PRODUCT COMPOSITE, METHOD FOR PRODUCING CURED PRODUCT COMPOSITE, AND SEMI-CURED PRODUCT COMPOSITE | デンカ株式会社 | 2022-10-06 | — | — | WO | disclosed |
| EP-4067395-A1 | ESTER COMPOUND, METHOD FOR PRODUCING SAME, POLYMER, THERMOSETTING RESIN COMPOSITION AND CURED FILM | Kyoeisha Chemical Co., Ltd. (JP) | 2022-10-05 | — | — | EP | disclosed |
| CN-114829415-A | Ester compound, method for producing same, polymer, thermosetting resin composition, and cured film | 共荣社化学株式会社 | 2022-07-29 | — | — | CN | disclosed |
| US-20220213129-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2022-07-07 | — | — | US | disclosed |
| US-8158546-B2 | Transparent aqua-based nano sol-gel composition and method of applying the same | ONID TECHNOLOGY (SHANGHAI) CORP. (CN) | 2012-04-17 | — | — | US | disclosed |
| US-20120064240-A1 | TRANSPARENT AQUA-BASED NANO SOL-GEL COMPOSITION AND METHOD OF APPLYING THE SAME | ONID TECHNOLOGY (SHANGHAI) CORP. (CN) | 2012-03-15 | — | — | US | disclosed |
| US-20090123647-A1 | TRANSPARENT AQUA-BASED NANO SOL-GEL COMPOSITION AND METHOD OF APPLYING THE SAME | ONID TECHNOLOGY (SHANGHAI) CORP. (CN) | 2009-05-14 | — | — | US | disclosed |
| US-7466893-B2 | Curable resin composition for light guide formation, curable dry film for light guide formation, cured resin and light guide | KANSAI PAINT CO., LTD. (JP) | 2008-12-16 | — | — | US | disclosed |
| WO-2008143429-A1 | METHOD FOR PRODUCING A COATING AGENT FOR ANTI-GLARE COATING, AND THE COATING AGENT AND ANTI-GLARE FILM | HANWHA L & C CORP. (KR) | 2008-11-27 | — | — | WO | disclosed |
| US-20080226245-A1 | Epoxy resin that is modified with a tetraalkoxysilane or alkyltrialkoxysilane to form a hydrolyzable resin and another resin that is reactive with an epoxy group, such as an acrylic acid-acrylate copolymer; optical waveguides with high heat resistance, excellent mechanical strength and transparency | KANSAI PAINT CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-5821314-A | COMPOUND OR MIXTURE OF COMPOUNDS HAVING EPOXY GROUP, REACTIVE SILICON GROUP, HYDROXYL AND/OR CARBOXYL GROUP, ORGANIC CHELATE CATALYST CONTAINING TETRAVALENT TIN ATOM AND KETO-ENOL TAUTOMER | KANSAI PAINT COMPANY, LIMITED (JP) | 1998-10-13 | — | — | US | disclosed |
| US-5731037-A | CONTROLLING SURFACE MOISTURE OF BUILDING MATERIAL | KANSAI PAINT CO., LTD. (JP) | 1998-03-24 | — | — | US | disclosed |
| EP-0768326-A1 | THERMOSETTING COMPOSITION AND METHOD OF FORMING TOPCOATING FILM | KANSAI PAINT CO., LTD. (JP) | 1997-04-16 | — | — | EP | disclosed |