Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | RECQL | P46063 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | ESR1 | P03372 | 1/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | MGAM | O43451 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | SI | P14410 | 1/20 | 0.32 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.32 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | NAAA | Q02083 | 1/20 | 0.30 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1362097 | 0.85 | CYP2C19 (0.39) | MEN1CYP2C19RECQLKMT2AESR1 | |
| SCHEMBL9420707 | 0.83 | TSHR (0.39) | MGAMGAASIMGAM2 | |
| SCHEMBL2269296 | 0.83 | NAAA (0.36) | MEN1CYP2C19RECQLKMT2AESR1 | |
| SCHEMBL2254573 | 0.83 | ALDH1A1 (0.44) | ALDH1A1LMNA | |
| SCHEMBL20293875 | 0.83 | ALDH1A1 (0.34) | MEN1CYP2C19RECQLKMT2AALDH1A1 | |
| SCHEMBL1471664 | 0.81 | ALDH1A1 (0.38) | MEN1KMT2AALDH1A1SOAT1THRB | |
| SCHEMBL28702421 | 0.79 | NAAA (0.42) | ALDH1A1LMNANAAA | |
| SCHEMBL7157006 | 0.79 | MEN1 (0.36) | MEN1CYP2C19RECQLKMT2AESR1 | |
| SCHEMBL202380 | 0.79 | ALDH1A1 (0.40) | MEN1KMT2AALDH1A1THRBLMNA | |
| SCHEMBL15135938 | 0.79 | THRB (0.33) | ALDH1A1THRBLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 328 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104536265-A | Photoresist composition | ZHEJIANG YONGTAI TECHNOLOGY CO LTD | 2015-04-22 | — | — | CN | claimed |
| CN-103857751-A | Composition for preparing alignment layer, alignment layer prepared therefrom, and retardation film | DONGWOO FINE CHEM CO LTD | 2014-06-11 | — | — | CN | claimed |
| CN-100429248-C | Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD | DONGJIN SAEMIGUNG CO LTD (KR) | 2008-10-29 | — | — | CN | claimed |
| CN-101059653-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-10-24 | — | — | CN | claimed |
| CN-1693322-A | Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD | DONGJIN SAEMIGUNG CO LTD (KR) | 2005-11-09 | — | — | CN | claimed |
| CN-105319837-B | Photoresist pattern forming method | 东友精细化工有限公司 | 2019-10-25 | — | — | CN | disclosed |
| CN-105824193-B | Photosensitive polymer combination, the cured film formed by it and with the image display device of the cured film | 东友精细化工有限公司 | 2019-10-25 | — | — | CN | disclosed |
| CN-105319850-B | Photosensitive polymer combination | 东友精细化工有限公司 | 2019-10-11 | — | — | CN | disclosed |
| CN-105824194-B | Photosensitive polymer combination, the photocuring pattern formed by it and with its image display device | 东友精细化工有限公司 | 2019-10-11 | — | — | CN | disclosed |
| CN-105867069-B | Negative light-sensitive resin combination, the photocuring pattern and image display device formed using it | 东友精细化工有限公司 | 2019-10-08 | — | — | CN | disclosed |
| CN-110007563-A | Negative photosensitive resin constituent, clearance body, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2019-07-12 | — | — | CN | disclosed |
| CN-109976097-A | Form the method and substrate processing apparatus of micro- pattern | 三星电子株式会社 | 2019-07-05 | — | — | CN | disclosed |
| CN-1458209-A | Resin composition and protective film | JSR CORP (JP) | 2003-11-26 | — | — | CN | disclosed |
| CN-1457349-A | Radiation-sensitive composition capable of having refractive index distribution | JSR CORP (JP) | 2003-11-19 | — | — | CN | disclosed |
| CN-1445315-A | Ray sensitive compasition for preparing insulation film and display | JSR CORP (JP) | 2003-10-01 | — | — | CN | disclosed |
| CN-1432871-A | Photoresist composite and pattern forming process with it | SAMSUNG ELECTRONICS CO LTD (KR) | 2003-07-30 | — | — | CN | disclosed |
| CN-1427043-A | Particle, composition and protective film | JSR CORP (JP) | 2003-07-02 | — | — | CN | disclosed |
| CN-1427306-A | Radiation sensitive refractivity change composition and method for changing refractivity | JSR CORP (JP) | 2003-07-02 | — | — | CN | disclosed |
| CN-1414048-A | Solidified composition forming as protective membrane, forming method of the membrance and the membrane | JSR CORP (JP) | 2003-04-30 | — | — | CN | disclosed |
| CN-1388919-A | Composition having refractive index sensitively changealbe by radiation and method for forming refractive index pattern | JSR CORP (JP) | 2003-01-01 | — | — | CN | disclosed |