SCHEMBL450741

SCHEMBL450741

NCCc1ccc(OCCCCCc2ccccc2)cc1

nearest known ligand 0.97

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 2/20 0.63
FFAR1 O14842 2/20 0.62
LTA4H P09960 1/20 0.59
NPC1 O15118 1/20 0.59
RAB9A P51151 1/20 0.59
S1PR1 P21453 3/20 0.56
S1PR3 Q99500 1/20 0.56
S1PR5 Q9H228 1/20 0.56
CYP2A6 P11509 1/20 0.55
SMN1; SMN2 Q16637 1/20 0.55
TAAR1 Q96RJ0 1/20 0.55
LOXL2 Q9Y4K0 1/20 0.55
MAOA P21397 1/20 0.55
PLA2G4B P0C869 1/20 0.55
MAOB P27338 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1586637 0.98 HTR2A (0.66) HTR2AFFAR1LTA4HNPC1RAB9A
SCHEMBL4658022 0.93 FFAR1 (0.62) HTR2AFFAR1LTA4HNPC1RAB9A
SCHEMBL13886620 0.93 HTR2A (0.68) HTR2AFFAR1LTA4HNPC1RAB9A
SCHEMBL14599625 0.89 TAAR1 (0.57) HTR2ATAAR1MAOB
SCHEMBL2163896 0.89 TAAR1 (0.57) HTR2ATAAR1MAOB
SCHEMBL11348028 0.88 RAB9A (0.77) FFAR1NPC1RAB9AS1PR1S1PR3
SCHEMBL9819860 0.88 FFAR1 (0.64) FFAR1LTA4HNPC1RAB9AS1PR1
SCHEMBL13886600 0.87 NPC1 (0.76) HTR2AFFAR1LTA4HNPC1RAB9A
Hydrochloric Acid SCHEMBL5519833 0.87 MAOB (0.58) TAAR1MAOB
Hydrochloric Acid SCHEMBL4450595 0.86 NPC1 (0.73) HTR2AFFAR1LTA4HNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8653305-B2 Compound having S1P receptor binding potency and use thereof ONO PHARMACEUTICAL CO., LTD. (JP) 2014-02-18 US claimed
US-10570269-B2 Composition containing microparticles TOKYO OHKA KOGYO CO., LTD. (JP) 2020-02-25 US disclosed
US-20180194930-A1 COMPOSITION CONTAINING MICROPARTICLES TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-12 US disclosed
US-9484240-B2 Film adhesive, dicing tape with film adhesive, method of manufacturing semiconductor device, and semiconductor device NITTO DENKO CORPORATION (JP) 2016-11-01 US disclosed
US-20160240394-A1 Semiconductor Device Manufacturing Method NITTO DENKO CORPORATION (JP) 2016-08-18 US disclosed
US-20160042836-A1 Insulated Wire, Rotary Electric Machine, and Method for Manufacturing Insulated Wire HITACHI, LTD. (JP) 2016-02-11 US disclosed
US-9242948-B2 Diepoxy compound, process for producing same, and composition containing the diepoxy compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-01-26 US disclosed
US-20160013089-A1 SEMICONDUCTOR DEVICE PRODUCTION METHOD, SHEET-SHAPED RESIN COMPOSITION, DICING TAPE-INTEGRATED SHEET-SHAPED RESIN COMPOSITION NITTO DENKO CORPORATION (JP) 2016-01-14 US disclosed
US-9202795-B2 Laminated film and use thereof NITTO DENKO CORPORATION (JP) 2015-12-01 US disclosed
US-9153556-B2 Adhesive sheet for manufacturing semiconductor device, manufacturing method of semiconductor device using the sheet, and semiconductor device obtained by the method NITTO DENKO CORPORATION (JP) 2015-10-06 US disclosed
US-20070088027-A1 Carboxylic acid derivatives and pharmaceutical compositions comprising the same as an active ingredient ONO PHARMACEUTICAL CO., LTD. 2007-04-19 US disclosed
EP-1760071-A1 COMPOUND HAVING S1P RECEPTOR BINDING POTENCY AND USE THEREOF ONO PHARMACEUTICAL CO., LTD. (JP) 2007-03-07 EP disclosed
US-7179817-B2 Carboxylic acid derivatives and drugs containing the same as the active ingredient ONO PHARMACEUTICAL CO., LTD. (JP) 2007-02-20 US disclosed
EP-1698625-A1 EPOXY COMPOUNDS AND CURED EPOXY RESINS OBTAINED BY CURING THE COMPOUNDS Sumitomo Chemical Company, Limited (JP) 2006-09-06 EP disclosed
US-20060159929-A1 Epoxy compound and cured epoxy resin product HITACHI, LTD. (JP) 2006-07-20 US disclosed
US-20050228148-A1 having high flame retardancy; having a structural unit derived from a secondary phosphine preferably at least one selected from 1,4-cyclooctylenephosphine oxide and 1,5-cyclooctylenephosphine oxide NIPPON CHEMICAL INDUSTRIAL CO., LTD. (JP) 2005-10-13 US disclosed
US-20050156321-A1 Process for producing a semiconductor device NITTO DENKO CORPORATION (JP) 2005-07-21 US disclosed
EP-1544908-A1 Process for mounting a semiconductor device NITTO DENKO CORPORATION (JP) 2005-06-22 EP disclosed
US-20040224941-A1 Carboxylic acid derivatives and drugs containing the same as the active ingredient ONO PHARMACEUTICAL CO., LTD. (JP) 2004-11-11 US disclosed
EP-1391199-A1 CARBOXYLIC ACID DERIVATIVES AND DRUGS CONTAINING THE SAME AS THE ACTIVE INGREDIENT ONO PHARMACEUTICAL CO., LTD. (JP) 2004-02-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180194930-A1 COMPOSITION CONTAINING MICROPARTICLES CHMP4B, EXOSC10, EXOSC9 HTR2A 1406/4885FFAR1 4324/4885LTA4H 1857/4885
US-20070088027-A1 Carboxylic acid derivatives and pharmaceutical compositions comprising the same as an active ingredient EDF1, FFAR1, EDNRA HTR2A 2851/4885FFAR1 2/4885LTA4H 1329/4885
US-10570269-B2 Composition containing microparticles CHMP4B, EXOSC10, EXOSC9 HTR2A 1406/4885FFAR1 4324/4885LTA4H 1857/4885
US-20040224941-A1 Carboxylic acid derivatives and drugs containing the same as the active ingredient EDF1, FFAR1, VCAM1 HTR2A 2913/4885FFAR1 2/4885LTA4H 1366/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.