Propionic Acid

Propionic Acid

SCHEMBL452676

CCC(=O)O.CCC(=O)O.N#CCC(=O)O

nearest known ligand 0.56

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
FFAR3 O14843 2/20 0.56
MCL1 Q07820 5/20 0.46
ALDH1A1 P00352 4/20 0.35
HDAC3 O15379 1/20 0.35
HDAC1 Q13547 1/20 0.35
HDAC2 Q92769 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
TDP1 Q9NUW8 2/20 0.33
GAA P10253 1/20 0.32
KDM4E B2RXH2 1/20 0.31
AKR1B1 P15121 1/20 0.31
MEN1 O00255 2/20 0.30
KMT2A Q03164 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propionic Acid SCHEMBL10538956 0.97 FFAR3 (0.53) FFAR3MCL1ALDH1A1HDAC3HDAC1
Propionic Acid SCHEMBL2141793 0.97 FFAR3 (0.53) FFAR3MCL1ALDH1A1HDAC3HDAC1
Propionic Acid SCHEMBL28451920 0.97 FFAR3 (0.53) FFAR3MCL1ALDH1A1HDAC3HDAC1
Alcohol SCHEMBL4450662 0.89
Methyl Alcohol SCHEMBL27928369 0.88
Ethane SCHEMBL621831 0.88
SCHEMBL30536998 0.88
SCHEMBL30022145 0.88
SCHEMBL16130 0.88
SCHEMBL27567423 0.88 MCL1 (0.53) FFAR3MCL1ALDH1A1KDM4EMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11898250-B2 Formulation for the etching of polymer materials prior to coating of the materials AVANZARE INNOVACIÓN TECNOLÓGICA, S.L. (ES) 2024-02-13 US claimed
EP-3689477-A1 FORMULATION FOR MORDANTING POLYMERIC MATERIALS PRIOR TO COATING SAME Avanzare Innovacion Tencologica S.L. (ES) 2020-08-05 EP claimed
CN-111201091-A Formulations for etching polymeric materials prior to coating thereof 阿万扎雷创新科技有限公司 2020-05-26 CN claimed
US-20200080203-A1 FORMULATION FOR THE ETCHING OF POLYMER MATERIALS PRIOR TO COATING OF THE MATERIALS AVANZARE INNOVACION TECNOLOGICA S L (ES) 2020-03-12 US claimed
US-10501852-B2 Formulation for the etching of polymer materials prior to coating of the materials AVANZARE INNOVACIÓN TECNOLÓGICA, S,L. (ES) 2019-12-10 US claimed
US-20190136381-A1 FORMULATION FOR THE ETCHING OF POLYMER MATERIALS PRIOR TO COATING OF THE MATERIALS AVANZARE INNOVACIÓN TECNOLÓGICA, S,L. (ES) 2019-05-09 US claimed
US-11898250-B2 Formulation for the etching of polymer materials prior to coating of the materials AVANZARE INNOVACIÓN TECNOLÓGICA, S.L. (ES) 2024-02-13 US disclosed
US-11761091-B2 Surface activated polymers SRG GLOBAL LIRIA, S.L. (ES) 2023-09-19 US disclosed
EP-3848483-A2 SURFACE ACTIVATED POLYMERS SRG Global Liria, S.L. (ES) 2021-07-14 EP disclosed
EP-3565915-B1 SURFACE ACTIVATED POLYMERS SRG GLOBAL LIRIA S L (ES) 2021-01-20 EP disclosed
US-20200255947-A1 SURFACE ACTIVATED POLYMERS SRG GLOBAL LIRIA S.L. (ES) 2020-08-13 US disclosed
CN-111511962-A Surface-activated polymers SRG利里亚全球有限公司 2020-08-07 CN disclosed
EP-3689477-A1 FORMULATION FOR MORDANTING POLYMERIC MATERIALS PRIOR TO COATING SAME Avanzare Innovacion Tencologica S.L. (ES) 2020-08-05 EP disclosed
EP-2740500-A2 Composition for use in the prophylaxis of post-surgical adhesions AESCULAP AG (DE) 2014-06-11 EP disclosed
EP-2261264-B1 METHOD OF MANUFACTURING PARTICULATE WATER ABSORBENT WITH WATER-ABSORBENT RESIN AS MAIN INGREDIENT NIPPON CATALYTIC CHEM IND (JP) 2013-10-09 EP disclosed
US-20120064535-A1 METHOD OF PREPARING SAMPLES CONTAINING NUCLEIC ACIDS OLYMPUS CORPORATION (JP) 2012-03-15 US disclosed
US-20110039961-A1 Method for producing particulate water absorbing agent containing water absorbent resin as main component NIPPON SHOKUBAI CO., LTD. (JP) 2011-02-17 US disclosed
EP-2261264-A1 METHOD OF MANUFACTURING PARTICULATE WATER ABSORBENT WITH WATER-ABSORBENT RESIN AS MAIN INGREDIENT Nippon Shokubai Co., Ltd. (JP) 2010-12-15 EP disclosed
US-7704307-B2 containing water soluble palladium compound, at least one of ammonia, an amine compound, an aminocarboxylic acid compound, carboxylic acid, and bismuth; plating liquid has good stability and provides a film with excellent corrosion resistance, solder bondability, and wire bondability NIPPON MINING & METALS CO., LTD. (JP) 2010-04-27 US disclosed
US-20090081369-A1 containing water soluble palladium compound, at least one of ammonia, an amine compound, an aminocarboxylic acid compound, carboxylic acid, and bismuth; plating liquid has good stability and provides a film with excellent corrosion resistance, solder bondability, and wire bondability JX NIPPON MINING & METALS CORPORATION (JP) 2009-03-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120064535-A1 METHOD OF PREPARING SAMPLES CONTAINING NUCLEIC ACIDS ADAR, POLRMT, NOP2 FFAR3 3908/4885MCL1 3647/4885ALDH1A1 2312/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.