SCHEMBL452742

SCHEMBL452742

C[CH]Oc1ccc(-c2ccccc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.43
CYP1A2 P05177 3/20 0.42
GAA P10253 1/20 0.42
CYP2C9 P11712 1/20 0.42
PKM P14618 1/20 0.42
CYP2C19 P33261 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA9 Q16790 1/20 0.42
LSS P48449 1/20 0.41
CHRNB2 P17787 1/20 0.39
CHRNB4 P30926 1/20 0.39
CHRNA3 P32297 1/20 0.39
CHRNA7 P36544 1/20 0.39
CHRNA4 P43681 1/20 0.39
TDP1 Q9NUW8 2/20 0.39
MAPK1 P28482 1/20 0.39
CYP3A4 P08684 1/20 0.39
TAAR1 Q96RJ0 1/20 0.39
HSD17B10 Q99714 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL932 0.85
SCHEMBL16807837 0.82 CYP1A2 (0.40) ALDH1A1CYP1A2GAACYP2C9PKM
SCHEMBL8695676 0.81 LTA4H (0.57) CA1CA2CA9LMNASMN1; SMN2
SCHEMBL3690626 0.80 CYP1A1 (0.42) CYP1A2CYP2C9CYP2C19CYP3A4BACE1
SCHEMBL15349954 0.78 ALDH1A1 (0.45) ALDH1A1CYP1A2GAACYP2C9PKM
SCHEMBL15349953 0.78 ALDH1A1 (0.45) ALDH1A1CYP1A2GAACYP2C9PKM
SCHEMBL12673471 0.76 ALDH1A1 (0.43) ALDH1A1CYP1A2GAACYP2C9PKM
SCHEMBL1262464 0.76 CA1 (0.47) ALDH1A1CYP1A2GAACYP2C9PKM
SCHEMBL23581950 0.76 CHRNB2 (0.43) ALDH1A1CYP1A2GAACYP2C9PKM
SCHEMBL7720272 0.76 LTA4H (0.61) CYP1A2CYP2C9CYP2C19LMNAL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 379 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080227885-A1 Active Energy Beam-Curable Composition for Optical Material TOAGOSEI CO., LTD. (JP) 2008-09-18 US claimed
US-7173072-B2 Radiation-curable resin composition for forming optical part and optical part JSR CORPORATION (JP) 2007-02-06 US claimed
EP-0615159-B1 Silver halide photographic material FUJI PHOTO FILM CO LTD (JP) 2004-09-22 EP claimed
US-5604088-A METHINE DYE SENSITIZERS; LOW CALCIUM CONTENT; EXCELLENT PROCESS STABILITY; FORMS LESS STREAKS IN CONTINUOUS PROCESSING FUJI PHOTO FILM CO., LTD. (JP) 1997-02-18 US claimed
US-5561039-A SUPPORTED SILVER HALIDE LAYER SPECTRALLY SENSITIZED BY A RED-SENSITIVE METHINE BENZOTHIAZOLE DYE AND CONTAINING A THIOSULFONATE AND SULFINATE; ANTIFOGGING AGENTS; STORAGE STABILITY FUJI PHOTO FILM CO., LTD. (JP) 1996-10-01 US claimed
EP-0615159-A1 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1994-09-14 EP claimed
EP-0159584-B1 N-(AZOLYLCARBAMOYL)-HYDROXYL AMINES AND FUNGICIDES CONTAINING THEM BASF Aktiengesellschaft (DE) 1989-01-18 EP claimed
US-4678798-A PLANTS, SEEDS BASF AKTIENGESELLSCHAFT (DE) 1987-07-07 US claimed
EP-0159584-A2 N-(azolylcarbamoyl)-hydroxyl amines and fungicides containing them BASF Aktiengesellschaft (DE) 1985-10-30 EP claimed
US-20240218189-A1 PHOTOCURABLE COMPOSITION AND SHAPED PRODUCT OF THE PHOTOCURABLE COMPOSITION SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2024-07-04 US disclosed
EP-4393706-A1 PHOTOCURABLE COMPOSITION AND SHAPED PRODUCT OF THE PHOTOCURABLE COMPOSITION Sumitomo Rubber Industries, Ltd. (JP) 2024-07-03 EP disclosed
CN-118255940-A Photocurable composition and molded article formed therefrom 住友橡胶工业株式会社 2024-06-28 CN disclosed
WO-2024128203-A1 ANTIREFLECTION FILM 東山フイルム株式会社 2024-06-20 WO disclosed
US-20240191088-A1 CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD CANON KABUSHIKI KAISHA (JP) 2024-06-13 US disclosed
US-5183870-A A curable polybutylene glycol di(meth)acrylate, a urethane or epoxy (meth)acrylate and a (meth)acrylate; heat and water resistance; impact strength; dyeability; workability MITSUBISHI RAYON CO., LTD (JP) 1993-02-02 US disclosed
EP-0441383-A2 Use of a copolymer for the making of contact lenses MITSUBISHI RAYON CO., LTD. (JP) 1991-08-14 EP disclosed
EP-0386404-A2 Liquid crystal/rigid rodlike polymer modified epoxy/vinyl ester resins THE DOW CHEMICAL COMPANY (US) 1990-09-12 EP disclosed
EP-0159584-B1 N-(AZOLYLCARBAMOYL)-HYDROXYL AMINES AND FUNGICIDES CONTAINING THEM BASF Aktiengesellschaft (DE) 1989-01-18 EP disclosed
US-4678798-A PLANTS, SEEDS BASF AKTIENGESELLSCHAFT (DE) 1987-07-07 US disclosed
EP-0159584-A2 N-(azolylcarbamoyl)-hydroxyl amines and fungicides containing them BASF Aktiengesellschaft (DE) 1985-10-30 EP disclosed