SCHEMBL4527668

SCHEMBL4527668

CCCCOc1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 3/20 0.68
CA1 P00915 3/20 0.68
CA2 P00918 3/20 0.68
CA9 Q16790 3/20 0.68
TSHR P16473 3/20 0.68
CA7 P43166 2/20 0.68
MAPK1 P28482 1/20 0.59
RECQL P46063 1/20 0.59
L3MBTL1 Q9Y468 1/20 0.59
MMP1 P03956 2/20 0.55
ADAMTS4 O75173 1/20 0.55
MMP2 P08253 1/20 0.55
MMP13 P45452 1/20 0.55
MMP14 P50281 1/20 0.55
ADAMTS5 Q9UNA0 1/20 0.55
LMNA P02545 2/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
LTA4H P09960 1/20 0.52
NR5A1 Q13285 1/20 0.52
NPC1 O15118 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7368029 0.98 CA12 (0.66) CA12CA1CA2CA9TSHR
SCHEMBL4535363 0.96 TSHR (0.64) CA12CA1CA2CA9TSHR
SCHEMBL4537643 0.95 TSHR (0.62) CA12CA1CA2CA9TSHR
SCHEMBL4524560 0.95 TSHR (0.62) CA12CA1CA2CA9TSHR
SCHEMBL4530059 0.95 TSHR (0.62) CA12CA1CA2CA9TSHR
SCHEMBL4529708 0.95 TSHR (0.62) CA12CA1CA2CA9TSHR
SCHEMBL4533781 0.95 TSHR (0.62) CA12CA1CA2CA9TSHR
SCHEMBL4527703 0.95 TSHR (0.62) CA12CA1CA2CA9TSHR
SCHEMBL4533770 0.95 TSHR (0.62) CA12CA1CA2CA9TSHR
SCHEMBL4539506 0.95 TSHR (0.62) CA12CA1CA2CA9TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4404273-A Process for the production of photographic color images by the silver dye bleach process CIBA-GEIGY AG (CH) 1983-09-13 US claimed
US-9707757-B2 Photosensitive negative resin composition CANON KABUSHIKI KAISHA (JP) 2017-07-18 US disclosed
US-9707757-B2 Photosensitive negative resin composition CANON KABUSHIKI KAISHA (JP) 2017-07-18 US disclosed
US-9268222-B2 Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head CANON KABUSHIKI KAISHA (JP) 2016-02-23 US disclosed
US-9268222-B2 Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head CANON KABUSHIKI KAISHA (JP) 2016-02-23 US disclosed
US-20150336892-A1 COMPOUNDS AND METHODS FOR INHIBITING NHE-MEDIATED ANTIPORT IN THE TREATMENT OF DISORDERS ASSOCIATED WITH FLUID RETENTION OR SALT OVERLOAD AND GASTROINTESTINAL TRACT DISORDERS ARDELYX, INC (US) 2015-11-26 US disclosed
US-9196864-B2 Encapsulated structure of light-emitting device, encapsulating process thereof and display device comprising encapsulated structure BOE TECHNOLOGY GROUP CO., LTD. (CN) 2015-11-24 US disclosed
EP-2628050-B1 PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION CANON KK (JP) 2015-09-09 EP disclosed
US-8975003-B2 Photosensitive negative resin composition CANON KABUSHIKI KAISHA (JP) 2015-03-10 US disclosed
US-8975003-B2 Photosensitive negative resin composition CANON KABUSHIKI KAISHA (JP) 2015-03-10 US disclosed
US-7534554-B2 Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition NEC ELECTRONICS CORPORATION (JP) 2009-05-19 US disclosed
US-20080233518-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE WITH SUCH CHEMICALLY AMPLIFIED RESIST COMPOSITION NEC ELECTRONICS CORPORATION (JP) 2008-09-25 US disclosed
US-7396633-B2 Damascene process; forming connectors; exposure; development; using acid generator, quencher and buffer NEC ELECTRONICS CORPORATION (JP) 2008-07-08 US disclosed
US-20070141513-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. 2007-06-21 US disclosed
US-7192681-B2 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-03-20 US disclosed
US-20040259029-A1 Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition NEC ELECTRONICS CORPORATION (JP) 2004-12-23 US disclosed
EP-0054513-B1 PROCESS FOR THE PRODUCTION OF PHOTOGRAPHIC COLOUR IMAGES ACCORDING TO THE SILVER DYE BLEACHING PROCESS, AND PHOTOGRAPHIC MATERIAL USED IN THIS PROCESS CIBA-GEIGY AG (CH) 1985-10-30 EP disclosed
US-4465763-A OIL SOLUBLE TRIAZINE COMPOUND AND A PHENYL AMINE COUPLER CIBA GEIGY AG (CH) 1984-08-14 US disclosed
US-4404273-A Process for the production of photographic color images by the silver dye bleach process CIBA-GEIGY AG (CH) 1983-09-13 US disclosed
EP-0054513-A1 Process for the production of photographic colour images according to the silver dye bleaching process, and photographic material used in this process CIBA-GEIGY AG (CH) 1982-06-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150336892-A1 COMPOUNDS AND METHODS FOR INHIBITING NHE-MEDIATED ANTIPORT IN THE TREATMENT OF DISORDERS ASSOCIATED WITH FLUID RETENTION OR SALT OVERLOAD AND GASTROINTESTINAL TRACT DISORDERS SLC10A1, SLC10A2, FABP2 CA12 2856/4885CA1 3458/4885CA2 587/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.