Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN1 | Q05586 | 6/20 | 0.45 |
| ▸ | GRIN2A | Q12879 | 6/20 | 0.45 |
| ▸ | GRIN2D | O15399 | 5/20 | 0.45 |
| ▸ | GRIN3B | O60391 | 5/20 | 0.45 |
| ▸ | GRIN2B | Q13224 | 5/20 | 0.45 |
| ▸ | GRIN2C | Q14957 | 5/20 | 0.45 |
| ▸ | GRIN3A | Q8TCU5 | 5/20 | 0.45 |
| ▸ | LMNA | P02545 | 4/20 | 0.44 |
| ▸ | SLC22A2 | O15244 | 2/20 | 0.44 |
| ▸ | SLC47A1 | Q96FL8 | 2/20 | 0.44 |
| ▸ | SLC22A1 | O15245 | 2/20 | 0.44 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | STAT6 | P42226 | 1/20 | 0.44 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.44 |
| ▸ | PMP22 | Q01453 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | BLM | P54132 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28327525 | 1.00 | GRIN1 (0.45) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| SCHEMBL3361 | 1.00 | GRIN1 (0.45) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| Phosphine SCHEMBL25178082 | 0.96 | GRIN1 (0.43) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| Ammonia Solution, Strong SCHEMBL6964589 | 0.96 | GRIN1 (0.43) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| Water SCHEMBL27642476 | 0.96 | GRIN1 (0.43) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| Hydrochloric Acid SCHEMBL11259068 | 0.96 | LMNA (0.47) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| Ammonia Solution, Strong SCHEMBL28253098 | 0.93 | GRIN1 (0.41) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| Methane SCHEMBL7511046 | 0.90 | LMNA (0.43) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| Acetic Acid SCHEMBL9168733 | 0.83 | THRB (0.41) | TSHRTHRBEPHX2CYP2C9 | |
| Acetic Acid SCHEMBL9166776 | 0.83 | THRB (0.41) | TSHRTHRBEPHX2CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 362 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114763394-A | Nonionic hyperbranched hydrophobically associating polyacrylamide thickening agent and preparation method thereof | 中国石油天然气股份有限公司 | 2022-07-19 | — | — | CN | claimed |
| CN-114751829-A | Polymerizable nonionic surfactant containing adamantane structure and preparation method thereof | 中国石油天然气股份有限公司 | 2022-07-15 | — | — | CN | claimed |
| EP-1007518-A4 | SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE | SEPRACOR INC (US) | 2002-11-06 | — | — | EP | claimed |
| US-6177572-B1 | 2-AMIDOPHENOL OR 2-AMIDOTHIOPHENOL IS COUPLED TO A SOLID PHASE SUPPORT THROUGH A LINKER GROUP, SUCH THAT A BENZOXAZOLE OR A BENZOTHIAZOLE IS FORMED | SEPRACOR, INC. | 2001-01-23 | — | — | US | claimed |
| EP-1007518-A1 | SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE | SEPRACOR, INC. (US) | 2000-06-14 | — | — | EP | claimed |
| WO-1999009017-A1 | SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE | SEPRACOR INC. (US) | 1999-02-25 | — | — | WO | claimed |
| WO-2024135498-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2024-06-27 | — | — | WO | disclosed |
| US-20240210825-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| CN-113939767-B | Positive photosensitive resin composition and organic EL element partition wall | 日保丽公司 | 2024-06-25 | — | — | CN | disclosed |
| WO-2024127977-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024122425-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024122423-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND ACID GENERATOR | 東京応化工業株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024117106-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID GENERATOR | 東京応化工業株式会社 | 2024-06-06 | — | — | WO | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| US-6177572-B1 | 2-AMIDOPHENOL OR 2-AMIDOTHIOPHENOL IS COUPLED TO A SOLID PHASE SUPPORT THROUGH A LINKER GROUP, SUCH THAT A BENZOXAZOLE OR A BENZOTHIAZOLE IS FORMED | SEPRACOR, INC. | 2001-01-23 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| US-6087063-A | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-07-11 | — | — | US | disclosed |
| EP-1007518-A1 | SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE | SEPRACOR, INC. (US) | 2000-06-14 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| WO-1999009017-A1 | SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE | SEPRACOR INC. (US) | 1999-02-25 | — | — | WO | disclosed |