SCHEMBL453279

SCHEMBL453279

O=C(O)C(=C(F)F)C(F)(F)C1(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7263045 0.74 ALDH1A1 (0.31)
SCHEMBL9389983 0.69
SCHEMBL124489 0.68 CA2 (0.30)
SCHEMBL3962713 0.68
SCHEMBL6792791 0.66
SCHEMBL9298976 0.66
SCHEMBL38662617 0.66
SCHEMBL11404349 0.65
SCHEMBL563501 0.65
SCHEMBL705264 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10035915-B2 Low refractive index coating for optical fibers, methods of manufacture thereof and articles comprising the same OFS FITEL, LLC (US) 2018-07-31 US claimed
US-20160369103-A1 LOW REFRACTIVE INDEX COATING FOR OPTICAL FIBERS, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME OFS FITEL LLC (US) 2016-12-22 US claimed
US-9604891-B2 Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2017-03-28 US disclosed
US-9488914-B2 Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2016-11-08 US disclosed
US-20150361026-A1 Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2015-12-17 US disclosed
US-20150198879-A1 Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-07-16 US disclosed
US-8663903-B2 Top coating composition CENTRAL GLASS COMPANY, LIMITED (JP) 2014-03-04 US disclosed
US-20130216960-A1 Water Repellent Additive for Immersion Resist CENTRAL GLASS COMPANY, LIMITED (JP) 2013-08-22 US disclosed
US-20120064459-A1 Water Repellent Additive for Immersion Resist CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-15 US disclosed
US-20120040294-A1 Top Coating Composition CENTRAL GLASS COMPANY, LIMITED (JP) 2012-02-16 US disclosed
EP-1645554-B1 NOVEL POLYMERIZABLE ACRYLATE COMPOUND CONTAINING HEXAFLUOROCARBINOL GROUP AND POLYMER MADE THEREFROM CENTRAL GLASS CO LTD (JP) 2010-12-08 EP disclosed
EP-1645554-A1 NOVEL POLYMERIZABLE ACRYLATE COMPOUND CONTAINING HEXAFLUOROCARBINOL GROUP AND POLYMER MADE THEREFROM Central Glass Company, Limited (JP) 2006-04-12 EP disclosed
US-20060057489-A1 Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same CENTRAL GLASS COMPANY, LIMITED (JP) 2006-03-16 US disclosed
US-20050250898-A1 Top coat composition CENTRAL GLASS COMPANY, LIMITED (JP) 2005-11-10 US disclosed
US-20040236046-A1 Fluorine-containing polymerisable monomer and polymer prepared by using same CENTRAL GLASS COMPANY, LIMITED (JP) 2004-11-25 US disclosed
US-6784312-B2 TO PRODUCE POLYMERS THAT HAVE HIGH TRANSPARENCY IN A WIDE WAVELENGTH REGION FROM VACUUM; IMPROVED ADHESION TO THE SUBSTRATE, AND IMPROVED FILM FORMING PROPERTY; REFLECTION PREVENTIVE MATERIAL, OPTICAL DEVICE MATERIAL OR RESIST CENTRAL GLASS COMPANY, LIMITED (JP) 2004-08-31 US disclosed
US-20030232940-A1 Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same CENTRAL GLASS COMPANY, LIMITED (JP) 2003-12-18 US disclosed
US-20030078352-A1 Fluorine-containing polymerisable monomer and polymer prepared by using same CENTRAL GLASS COMPANY, LIMITED (JP) 2003-04-24 US disclosed
US-6432526-B1 Crystal structure; for producing nanosize titanium-based oxide particles which increases refractive indexes 3M INNOVATIVE PROPERTIES COMPANY 2002-08-13 US disclosed
US-6329058-B1 INORGANIC PARTICLES CAPABLE OF MIXING WITH TRANSPARENT ORGANIC COMPOSITION, TITANIUM OXIDE AND CRYSTALS WITH ABSORPTION 3M INNOVATIVE PROPERTIES COMPANY 2001-12-11 US disclosed