⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705264 | 1.00 | — | — | |
| SCHEMBL1790076 | 0.69 | ALDH1A1 (0.35) | — | |
| SCHEMBL1790074 | 0.69 | ALDH1A1 (0.35) | — | |
| SCHEMBL124489 | 0.68 | CA2 (0.30) | — | |
| SCHEMBL28587613 | 0.66 | — | — | |
| SCHEMBL453279 | 0.65 | — | — | |
| SCHEMBL561588 | 0.62 | — | — | |
| SCHEMBL876761 | 0.62 | — | — | |
| SCHEMBL6131430 | 0.61 | — | — | |
| SCHEMBL108676 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9465291-B2 | Radiation-sensitive resin composition, polymer, compound, and method for producing compound | JSR CORPORATION (JP) | 2016-10-11 | — | — | US | disclosed |
| US-20140186771-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | JSR CORPORATION (JP) | 2014-07-03 | — | — | US | disclosed |
| US-8609318-B2 | Radiation-sensitive resin composition, method for forming resist pattern and polymer | JSR CORPORATION (JP) | 2013-12-17 | — | — | US | disclosed |
| US-20120034560-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER | JSR CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |