Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36050 | 0.90 | L3MBTL1 (0.31) | L3MBTL1 | |
| SCHEMBL807563 | 0.90 | L3MBTL1 (0.50) | L3MBTL1 | |
| SCHEMBL10202163 | 0.87 | L3MBTL1 (0.39) | L3MBTL1 | |
| SCHEMBL4536626 | 0.87 | L3MBTL1 (0.39) | L3MBTL1 | |
| SCHEMBL4540605 | 0.87 | L3MBTL1 (0.39) | L3MBTL1 | |
| SCHEMBL13706072 | 0.85 | L3MBTL1 (0.32) | L3MBTL1 | |
| SCHEMBL14756634 | 0.81 | — | — | |
| SCHEMBL12430562 | 0.81 | — | — | |
| SCHEMBL21414069 | 0.80 | L3MBTL1 (0.61) | L3MBTL1 | |
| SCHEMBL1520247 | 0.78 | L3MBTL1 (0.44) | L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9664827-B2 | Colored composition, method of producing color filter using the same, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-05-30 | — | — | US | disclosed |
| US-9632222-B2 | Method for manufacturing a color filter, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-20170102618-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2017-04-13 | — | — | US | disclosed |
| US-9507257-B2 | Method for manufacturing a color filter, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2016-11-29 | — | — | US | disclosed |
| US-9442373-B2 | Method of producing color filter and solid-state imaging device having colored composition containing color agent | FUJIFILM CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-9442374-B2 | Coloring composition, method for manufacturing a color filter using the same, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-20160147154-A1 | PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20140242359-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR CROSSLINKED LAYER FORMATION TO BE USED IN THE METHOD | FUJIFILM CORPORATION (JP) | 2014-08-28 | — | — | US | disclosed |
| US-20140178634-A1 | COLORING COMPOSITION, METHOD FOR MANUFACTURING A COLOR FILTER USING THE SAME, COLOR FILTER AND SOLID-STATE IMAGING DEVICE | FUJIFILM CORPORATION (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20140127629-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-05-08 | — | — | US | disclosed |
| US-8663907-B2 | Method of forming pattern | FUJIFILM CORPORATION (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8637222-B2 | Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern | FUJIFILM CORPORATION (JP) | 2014-01-28 | — | — | US | disclosed |
| WO-2013065878-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR CROSSLINKED LAYER FORMATION TO BE USED IN THE METHOD | FUJIFILM CORPORATION (JP) | 2013-05-10 | — | — | WO | disclosed |
| US-20130101812-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2013-04-25 | — | — | US | disclosed |
| WO-2012062615-A2 | BINDER FOR WOOD MATERIALS | EVONIK DEGUSSA GMBH (DE) | 2012-05-18 | — | — | WO | disclosed |
| US-20120052449-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20110287234-A1 | NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2011-11-24 | — | — | US | disclosed |
| US-7432034-B2 | Negative resist composition | FUJIFILM CORPORATION (JP) | 2008-10-07 | — | — | US | disclosed |
| US-7432034-B2 | Negative resist composition | FUJIFILM CORPORATION (JP) | 2008-10-07 | — | — | US | disclosed |