Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4540306 | 0.90 | L3MBTL1 (0.42) | L3MBTL1 | |
| SCHEMBL14756634 | 0.90 | — | — | |
| SCHEMBL12166047 | 0.87 | TP53 (0.34) | — | |
| SCHEMBL13706072 | 0.87 | L3MBTL1 (0.32) | L3MBTL1 | |
| SCHEMBL12430562 | 0.86 | — | — | |
| SCHEMBL19959610 | 0.82 | L3MBTL1 (0.36) | L3MBTL1 | |
| SCHEMBL4540605 | 0.81 | L3MBTL1 (0.39) | L3MBTL1 | |
| SCHEMBL10202163 | 0.81 | L3MBTL1 (0.39) | L3MBTL1 | |
| SCHEMBL2605558 | 0.81 | POLB (0.46) | — | |
| SCHEMBL10801004 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 677 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119591780-A | Photoresist additive and photoresist composition | 合肥鼎材科技有限公司 | 2025-03-11 | — | — | CN | claimed |
| CN-113087843-B | Polymer and photoresist composition containing same | 北京鼎材科技有限公司 | 2023-10-13 | — | — | CN | claimed |
| US-11520083-B2 | Member, imaging apparatus, and method for producing member | CANON KABUSHIKI KAISHA (JP) | 2022-12-06 | — | — | US | claimed |
| CN-122095297-A | Composition for forming cured film, alignment material, and phase difference material | — | 2026-05-26 | — | — | CN | disclosed |
| US-12527163-B2 | Method for producing light-emitting elements | CENTRAL GLASS COMPANY, LIMITED (JP) | 2026-01-13 | — | — | US | disclosed |
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003283-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003284-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED SILICON-CONTAINING RESIN FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003277-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| EP-4667537-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-12-24 | — | — | EP | disclosed |
| CN-121165394-A | Photosensitive resin composition, cured film, and color light-shielding layer | 武汉柔显科技股份有限公司 | 2025-12-19 | — | — | CN | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1703328-A1 | COMPOSITION FOR FORMING NITRIDE COATING FILM FOR HARD MASK | Nissan Chemical Industries, Ltd. (JP) | 2006-09-20 | — | — | EP | disclosed |
| EP-1681594-A1 | COMPOSITION FOR FORMING UNDERLYING FILM CONTAINING DEXTRIN ESTER COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2006-07-19 | — | — | EP | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| US-6864036-B2 | Negative-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-03-08 | — | — | US | disclosed |
| US-6406829-B1 | BLEND OF ALKALI-SOLUBLE RESIN, ONIUM SALT AND ETHYLENEUREA COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-06-18 | — | — | US | disclosed |
| US-20020061467-A1 | Negative-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-05-23 | — | — | US | disclosed |
| US-4705570-A | Method of manufacturing a bonded particulate article by reacting a polyol and a meterocyclic compound | AMERICAN CYANAMID COMPANY (US) | 1987-11-10 | — | — | US | disclosed |
| EP-0223113-A2 | Method of manufacturing a bonded particulate article by reacting a polyol and a heterocyclic compound | AMERICAN CYANAMID COMPANY (US) | 1987-05-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | L3MBTL1 521/4885 |
| US-20260003284-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED SILICON-CONTAINING RESIN FILM | ASH2L, SEM1, COL1A1 | L3MBTL1 2444/4885 |
| US-20260003277-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | L3MBTL1 464/4885 |
| US-20260003283-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN | RARA, COL1A1, TAS1R1 | L3MBTL1 3566/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.