Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4540306 | 0.90 | L3MBTL1 (0.42) | L3MBTL1 | |
| SCHEMBL1520247 | 0.87 | L3MBTL1 (0.44) | L3MBTL1 | |
| SCHEMBL19959612 | 0.87 | L3MBTL1 (0.44) | L3MBTL1 | |
| SCHEMBL10202162 | 0.87 | L3MBTL1 (0.44) | L3MBTL1 | |
| SCHEMBL18737691 | 0.87 | L3MBTL1 (0.39) | L3MBTL1 | |
| SCHEMBL4536626 | 0.81 | L3MBTL1 (0.39) | L3MBTL1 | |
| SCHEMBL31746108 | 0.77 | L3MBTL1 (0.52) | L3MBTL1 | |
| SCHEMBL11335882 | 0.77 | L3MBTL1 (0.34) | L3MBTL1 | |
| SCHEMBL10202163 | 0.77 | L3MBTL1 (0.39) | L3MBTL1 | |
| SCHEMBL4540605 | 0.77 | L3MBTL1 (0.39) | L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11048167-B2 | Positive photosensitive resin composition, patterned cured film production method, patterned cured film, and electronic component | HD MICROSYSTEMS, LTD. (JP) | 2021-06-29 | — | — | US | disclosed |
| US-20180074403-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNED CURED FILM PRODUCTION METHOD, PATTERNED CURED FILM, AND ELECTRONIC COMPONENT | HD MICROSYSTEMS, LTD. (JP) | 2018-03-15 | — | — | US | disclosed |
| EP-2133743-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PROCESS FOR PRODUCING PATTERNED HARDENED FILM WITH USE THEREOF AND ELECTRONIC PART | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD (JP) | 2018-01-24 | — | — | EP | disclosed |
| US-9664827-B2 | Colored composition, method of producing color filter using the same, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-05-30 | — | — | US | disclosed |
| US-9640396-B2 | Spin-on spacer materials for double- and triple-patterning lithography | BREWER SCIENCE INC. (US) | 2017-05-02 | — | — | US | disclosed |
| US-9632222-B2 | Method for manufacturing a color filter, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-20170102618-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2017-04-13 | — | — | US | disclosed |
| US-9507257-B2 | Method for manufacturing a color filter, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2016-11-29 | — | — | US | disclosed |
| US-9442373-B2 | Method of producing color filter and solid-state imaging device having colored composition containing color agent | FUJIFILM CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-9442374-B2 | Coloring composition, method for manufacturing a color filter using the same, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-20120052449-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20110287234-A1 | NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2011-11-24 | — | — | US | disclosed |
| US-20100170868-A1 | SPIN-ON SPACER MATERIALS FOR DOUBLE- AND TRIPLE-PATTERNING LITHOGRAPHY | BREWER SCIENCE INC. (US) | 2010-07-08 | — | — | US | disclosed |
| US-20100092879-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROCESS FOR PRODUCING PATTERNED HARDENED FILM WITH USE THEREOF AND ELECTRONIC PART | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2010-04-15 | — | — | US | disclosed |
| US-20100092879-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROCESS FOR PRODUCING PATTERNED HARDENED FILM WITH USE THEREOF AND ELECTRONIC PART | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2010-04-15 | — | — | US | disclosed |
| US-20090214606-A1 | ANTIMICROBIAL POROUS SILICON OXIDE PARTICLES | CIBA SPECIALTY CHEMICALS CORP. | 2009-08-27 | — | — | US | disclosed |
| US-7432034-B2 | Negative resist composition | FUJIFILM CORPORATION (JP) | 2008-10-07 | — | — | US | disclosed |
| US-7432034-B2 | Negative resist composition | FUJIFILM CORPORATION (JP) | 2008-10-07 | — | — | US | disclosed |
| US-4705570-A | Method of manufacturing a bonded particulate article by reacting a polyol and a meterocyclic compound | AMERICAN CYANAMID COMPANY (US) | 1987-11-10 | — | — | US | disclosed |
| EP-0223113-A2 | Method of manufacturing a bonded particulate article by reacting a polyol and a heterocyclic compound | AMERICAN CYANAMID COMPANY (US) | 1987-05-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090214606-A1 | ANTIMICROBIAL POROUS SILICON OXIDE PARTICLES | ORAI3, PRF1, THPO | L3MBTL1 2813/4885POLB 2176/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.