SCHEMBL455980

SCHEMBL455980

CCc1[c]cc(C)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL455347 0.82 ACHE (0.33)
SCHEMBL1134431 0.81 ACHE (0.30)
SCHEMBL10461628 0.78
SCHEMBL61322 0.78
SCHEMBL4625366 0.78 HTT (0.33)
SCHEMBL15061557 0.76 ESR1 (0.34)
SCHEMBL192917 0.75 TP53 (0.36)
SCHEMBL27828061 0.75
SCHEMBL4819118 0.75 AGXT (0.31)
SCHEMBL27834017 0.75 GABRA1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3041825-B1 PROCEDURE FOR THE SYNTHESIS OF N-BENZYL-N-CYCLOPROPYL-1H-PYRAZOLE-4-CARBOXAMIDE DERIVATIVES BAYER CROPSCIENCE AG (DE) 2019-03-13 EP claimed
US-9656965-B2 Procedure for the synthesis of N-benzyl-N-cyclopropyl-1H-pyrazole-4-carboxamide derivatives BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) 2017-05-23 US claimed
US-20160229808-A1 PROCEDURE FOR THE SYNTHESIS OF N-BENZYL-N-CYCLOPROPYL-1H-PYRAZOLE-4-CARBOXAMIDE DERIVATIVES BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) 2016-08-11 US claimed
EP-3041825-A1 PROCEDURE FOR THE SYNTHESIS OF N-BENZYL-N-CYCLOPROPYL-1H-PYRAZOLE-4-CARBOXAMIDE DERIVATIVES Bayer CropScience Aktiengesellschaft (DE) 2016-07-13 EP claimed
WO-2015032859-A1 PROCEDURE FOR THE SYNTHESIS OF N-BENZYL-N-CYCLOPROPYL-1H-PYRAZOLE-4-CARBOXAMIDE DERIVATIVES BAYER CROPSCIENCE AG (DE) 2015-03-12 WO claimed
EP-1199310-B1 PROCESS FOR THE PREPARATION OF CONDENSED PHOSPHORIC ESTERS DAIHACHI CHEM IND (JP) 2003-11-05 EP claimed
CN-114303096-A Film-forming composition for lithography, resist pattern formation method, circuit pattern formation method, and purification method 三菱瓦斯化学株式会社 2022-04-08 CN disclosed
WO-2021039843-A1 COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD AND PURIFICATION METHOD 三菱瓦斯化学株式会社 2021-03-04 WO disclosed
US-20210003921-A1 COMPOUND, RESIN, COMPOSITION, AND FILM FORMING MATERIAL FOR LITHOGRAPHY USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-01-07 US disclosed
EP-3760611-A1 COMPOUND, RESIN, COMPOSITION AND FILM-FORMING MATERIAL FOR LITHOGRAPHY USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-01-06 EP disclosed
EP-2841429-B1 TETRAZOLINONE COMPOUNDS AND ITS USE AS PESTICIDES SUMITOMO CHEMICAL CO (JP) 2020-10-21 EP disclosed
CN-111788176-A Compound, resin, composition, and film-forming material for lithography using same 三菱瓦斯化学株式会社 2020-10-16 CN disclosed
US-20200172470-A1 NOVEL (POLY)AMINE COMPOUND, RESIN AND CURED PRODUCT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-06-04 US disclosed
US-5627228-A ALKYLARYL PHOSPHATE, POLYTETRAFLOROETHYLENE, POLYCARBONATE, STYRENE POLYMERS DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1997-05-06 US disclosed
EP-0682081-A1 Flame-retardant resin composition DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1995-11-15 EP disclosed
US-5206157-A Cyclization of n-substituted dialkanolamine using Gluconobacter TEXACO INC. (US) 1993-04-27 US disclosed
US-4948386-A Middle distillate containing storage stability additive TEXACO INC. (US) 1990-08-14 US disclosed
US-4413013-A N-(((ARYLFORMAMIDOYL)METHYLAMINO)THIO)-N-SUBSTITUTED SULFONAMIDES THE UPJOHN COMPANY (US) 1983-11-01 US disclosed
US-4169106-A Antiarrhythmic N,N'-bis(phenylcarbamoylalkyl)amidines COOPER LABORATORIES, INC. (US) 1979-09-25 US disclosed
US-4139537-A 3-Aryloxy-1-(2- or 4-iminodihydro-1-pyridyl)-2-propanol antiarrhythmic compounds COOPER LABORATORIES, INC. (US) 1979-02-13 US disclosed