Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 2/20 | 0.35 |
| ▸ | IDO1 | P14902 | 5/20 | 0.43 |
| ▸ | KDM1A | O60341 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | NPC1 | O15118 | 2/20 | 0.36 |
| ▸ | HTR2C | P28335 | 1/20 | 0.36 |
| ▸ | HTR2B | P41595 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 2/20 | 0.35 |
| ▸ | NOX1 | Q9Y5S8 | 1/20 | 0.35 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.35 |
| ▸ | PIM1 | P11309 | 1/20 | 0.35 |
| ▸ | LTK | P29376 | 1/20 | 0.35 |
| ▸ | LIMK1 | P53667 | 1/20 | 0.35 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.35 |
| ▸ | CNR2 | P34972 | 1/20 | 0.34 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.33 |
| ▸ | RPS6KA2 | Q15349 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL2856656 | 0.88 | IDO1 (0.44) | IDO1KDM1AMEN1KMT2ANPC1 | |
| SCHEMBL110473 | 0.72 | IDO1 (0.44) | IDO1KDM1AMEN1KMT2ANPC1 | |
| Hydrochloric Acid SCHEMBL6830259 | 0.72 | IDO1 (0.44) | IDO1KDM1AMEN1KMT2ANPC1 | |
| Hydrochloric Acid SCHEMBL27540828 | 0.72 | IDO1 (0.44) | IDO1KDM1AMEN1KMT2ANPC1 | |
| Hydrochloric Acid SCHEMBL11238001 | 0.71 | IDO1 (0.43) | IDO1KDM1AMEN1KMT2ANPC1 | |
| Hydrochloric Acid SCHEMBL1123567 | 0.71 | ALDH1A1 (0.54) | MEN1KMT2ANPC1RAB9ANOX1 | |
| SCHEMBL2389945 | 0.70 | IDO1 (0.46) | IDO1KDM1AMEN1KMT2ANPC1 | |
| SCHEMBL29357242 | 0.70 | IDO1 (0.46) | IDO1KDM1AMEN1KMT2ANPC1 | |
| SCHEMBL27540827 | 0.70 | IDO1 (0.42) | IDO1KDM1AMEN1KMT2ANPC1 | |
| SCHEMBL27540826 | 0.70 | IDO1 (0.42) | IDO1KDM1AMEN1KMT2ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 392 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2003022233-A1 | AGENT FOR DYEING KERATIN FIBERS, CONTAINING A BLUE CATIONIC ANTHRAQUINONE DYE | WELLA AKTIENGESELLSCHAFT (DE) | 2003-03-20 | — | — | WO | claimed |
| CN-122095314-A | Photosensitive resin laminate, method for forming resist pattern, and method for manufacturing wiring board having conductor pattern | — | 2026-05-26 | — | — | CN | disclosed |
| WO-2026100708-A1 | PHOTOSENSITIVE RESIN LAMINATE, PHOTOSENSITIVE ELEMENT, AND PATTERN FORMING METHOD | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-122029490-A | Photosensitive resin laminate, method for forming resist pattern, and method for forming wiring board | 旭化成株式会社 | 2026-05-12 | — | — | CN | disclosed |
| CN-114114841-B | Photosensitive resin laminate and method for forming resist pattern | 旭化成株式会社 | 2026-05-12 | — | — | CN | disclosed |
| CN-120077329-A | Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern | 旭化成株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-120044756-A | Photosensitive resin composition | 旭化成株式会社 | 2025-05-27 | — | — | CN | disclosed |
| WO-2025095102-A1 | PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING WIRING BOARD HAVING CONDUCTOR PATTERN | 旭化成株式会社 | 2025-05-08 | — | — | WO | disclosed |
| WO-2025074970-A1 | PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING BOARD | 旭化成株式会社 | 2025-04-10 | — | — | WO | disclosed |
| CN-114174922-B | Photosensitive resin composition and photosensitive element | 旭化成株式会社 | 2025-03-04 | — | — | CN | disclosed |
| WO-1999059529-A2 | AGENTS AND METHOD FOR PRODUCING SEMI-PERMANENT COLORATIONS OF KERATIN FIBERS | WELLA AKTIENGESELLSCHAFT (DE) | 1999-11-25 | — | — | WO | disclosed |
| EP-0943316-A2 | Means for coloring and decoloring of hair | Wella Aktiengesellschaft (DE) | 1999-09-22 | — | — | EP | disclosed |
| EP-0898954-A2 | Composition for dyeing keratin fibres | Wella Aktiengesellschaft (DE) | 1999-03-03 | — | — | EP | disclosed |
| EP-0889719-A1 | AGENTS FOR DYING AND DECOLORIZING FIBERS | Wella Aktiengesellschaft (DE) | 1999-01-13 | — | — | EP | disclosed |
| EP-0877593-A1 | AGENT FOR DYEING AND DECOLORIZING FIBERS | Wella Aktiengesellschaft (DE) | 1998-11-18 | — | — | EP | disclosed |
| EP-0867171-A2 | Powder composition for the preparation of gels comprising a methyl hydroxyalkyl cellulose | Wella Aktiengesellschaft (DE) | 1998-09-30 | — | — | EP | disclosed |
| EP-0867170-A2 | Composition and method for dyeing keratin fibres | Wella Aktiengesellschaft (DE) | 1998-09-30 | — | — | EP | disclosed |
| WO-1998023247-A1 | AGENT FOR DYEING AND DECOLORIZING FIBERS | WELLA AKTIENGESELLSCHAFT (DE) | 1998-06-04 | — | — | WO | disclosed |
| WO-1998022078-A1 | AGENTS FOR DYING AND DECOLORIZING FIBERS | WELLA AKTIENGESELLSCHAFT (DE) | 1998-05-28 | — | — | WO | disclosed |
| EP-0327763-A2 | Colored salts of polymeric sulfonate polyanions and dye cations, and light-absorbing coatings made therewith | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-08-16 | — | — | EP | disclosed |