SCHEMBL4567267

SCHEMBL4567267

COCC(C)COC(C)=O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.42
ALOX15 P16050 1/20 0.41
ALDH1A1 P00352 5/20 0.40
HSD17B10 Q99714 2/20 0.40
LMNA P02545 2/20 0.40
TSHR P16473 3/20 0.38
SMN1; SMN2 Q16637 3/20 0.38
CHRM5 P08912 2/20 0.38
CHRM1 P11229 2/20 0.38
CHRM3 P20309 2/20 0.38
PGR P06401 1/20 0.38
CHRM2 P08172 1/20 0.38
CHRM4 P08173 1/20 0.38
HTR1A P08908 1/20 0.38
CHRNB2 P17787 1/20 0.38
TBXA2R P21731 1/20 0.38
CHRNB4 P30926 1/20 0.38
CHRNA3 P32297 1/20 0.38
CHRNA7 P36544 1/20 0.38
CHRNA4 P43681 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12124735 0.91 TDP1 (0.39) TDP1ALOX15ALDH1A1HSD17B10LMNA
SCHEMBL9756912 0.90 TDP1 (0.48) TDP1ALOX15ALDH1A1HSD17B10LMNA
Acetic Acid SCHEMBL27536519 0.85 TDP1 (0.45) TDP1ALOX15ALDH1A1HSD17B10LMNA
SCHEMBL3784335 0.82 ALOX15 (0.56) TDP1ALOX15ALDH1A1HSD17B10LMNA
SCHEMBL22689608 0.80 TDP1 (0.45) TDP1ALOX15ALDH1A1HSD17B10LMNA
SCHEMBL14621698 0.80 ALOX15 (0.39) TDP1ALOX15ALDH1A1HSD17B10LMNA
SCHEMBL23817270 0.79 MEN1 (0.32) TSHRMEN1KMT2AMAPT
SCHEMBL11619041 0.79 ALOX15 (0.58) TDP1ALOX15ALDH1A1HSD17B10LMNA
SCHEMBL3401939 0.79 TDP1 (0.41) TDP1ALOX15ALDH1A1HSD17B10LMNA
SCHEMBL17826864 0.79 TDP1 (0.41) TDP1ALOX15ALDH1A1HSD17B10LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2268727-B1 POLYOL ESTER PLASTICIZERS AND PROCESS OF MAKING THE SAME EXXONMOBIL CHEMICAL PATENTS INC (US) 2017-08-09 EP disclosed
US-20170051104-A1 POLYCARBONATE DIOL AND THERMOPLASTIC POLYURETHANE MADE FROM THE SAME DAIREN CHEMICAL CORPORATION (TW) 2017-02-23 US disclosed
US-20170051104-A1 POLYCARBONATE DIOL AND THERMOPLASTIC POLYURETHANE MADE FROM THE SAME DAIREN CHEMICAL CORPORATION (TW) 2017-02-23 US disclosed
US-8785917-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same FUJIFILM CORPORATION (JP) 2014-07-22 US disclosed
US-8778864-B2 Polyglyceryl compounds and compositions JOHNSON & JOHNSON CONSUMER COMPANIES, INC. (US) 2014-07-15 US disclosed
US-8660472-B2 Developing roller, process cartridge, and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2014-02-25 US disclosed
US-8455418-B2 Polyglyceryl compounds comprising a methyl glucoside or sorbitan remnant and compositions containing same JOHNSON & JOHNSON CONSUMER COMPANIES, INC. (US) 2013-06-04 US disclosed
US-8394755-B2 Polyglyceryl compounds and compositions JOHNSON & JOHNSON CONSUMER COMPANIES, INC. (US) 2013-03-12 US disclosed
US-20130001751-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed
US-8318890-B2 Polymer from 2-methyl-1,3-propanediol, and an alkylene diol having 2 to 20 carbons and 5-methyl-1,3-dioxan-2-one; intermediate for thermoplastic polyurethane ASAHI KASEI CHEMICALS CORPORATION (JP) 2012-11-27 US disclosed
US-7858159-B2 Photocurable composition for sealant, liquid crystal sealant, and liquid crystal panel DAINIPPON INK AND CHEMICALS, INC. (JP) 2010-12-28 US disclosed
US-20100080611-A1 DEVELOPING ROLLER, DEVELOPING ROLLER PRODUCTION METHOD, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS CANON KABUSHIKI KAISHA (JP) 2010-04-01 US disclosed
WO-2010028362-A1 POLYCARBONATE POLYOL COMPOSITIONS AND METHODS NOVOMER, INC. (US) 2010-03-11 WO disclosed
US-20090131550-A1 PHOTOCURABLE COMPOSITION FOR SEALANT, LIQUID CRYSTAL SEALANT, AND LIQUID CRYSTAL PANEL DAINIPPON INK AND CHEMICALS, INC. (JP) 2009-05-21 US disclosed
US-20080146766-A1 Polycarbonate Diol ASAHI KASEI KABUSHIKI KAISHA (JP) 2008-06-19 US disclosed
CN-1882880-A Aqueous resist composition SHOWA DENKO KK (JP) 2006-12-20 CN disclosed
US-20060154173-A1 Resist composition SHOWA DENKO K.K. (JP) 2006-07-13 US disclosed
EP-1644777-A2 RESIST COMPOSITION Showa Denko K.K. (JP) 2006-04-12 EP disclosed
WO-2005047978-A1 AQUEOUS RESIST COMPOSITION SHOWA DENKO K.K. (JP) 2005-05-26 WO disclosed
WO-2005003859-A2 RESIST COMPOSITION SHOWA DENKO K.K. (JP) 2005-01-13 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090131550-A1 PHOTOCURABLE COMPOSITION FOR SEALANT, LIQUID CRYSTAL SEALANT, AND LIQUID CRYSTAL PANEL TRPA1, ANXA1, ANXA11 TDP1 2283/4885ALOX15 290/4885ALDH1A1 776/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.