SCHEMBL22689608

SCHEMBL22689608

CC(=O)OCC(C)CCC(C)COC(C)=O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 1/20 0.45
▸ ALOX15 P16050 1/20 0.44
▸ ALDH1A1 P00352 5/20 0.43
▸ LMNA P02545 2/20 0.43
▸ HSD17B10 Q99714 1/20 0.43
▸ TSHR P16473 5/20 0.38
▸ PTPN1 P18031 1/20 0.38
▸ USP2 O75604 3/20 0.37
▸ CYP3A4 P08684 3/20 0.37
▸ MAPT P10636 3/20 0.37
▸ SMN1; SMN2 Q16637 3/20 0.37
▸ HPGD P15428 1/20 0.37
▸ MEN1 O00255 1/20 0.37
▸ TP53 P04637 1/20 0.37
▸ MAPK1 P28482 1/20 0.37
▸ KMT2A Q03164 1/20 0.37
▸ CHRM5 P08912 2/20 0.36
▸ CHRM1 P11229 2/20 0.36
▸ CHRM3 P20309 2/20 0.36
▸ PGR P06401 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15542591 0.93 PTPN1 (0.42) TDP1ALOX15ALDH1A1LMNAHSD17B10
SCHEMBL19248370 0.91 ALDH1A1 (0.42) TDP1ALOX15ALDH1A1LMNAHSD17B10
SCHEMBL25342022 0.91 ALDH1A1 (0.42) TDP1ALOX15ALDH1A1LMNAHSD17B10
SCHEMBL9756912 0.89 TDP1 (0.48) TDP1ALOX15ALDH1A1LMNAHSD17B10
SCHEMBL8336829 0.88 TDP1 (0.41) TDP1ALOX15ALDH1A1LMNAHSD17B10
SCHEMBL11619041 0.88 ALOX15 (0.58) TDP1ALOX15ALDH1A1LMNAHSD17B10
SCHEMBL1985053 0.88 ALDH1A1 (0.44) TDP1ALOX15ALDH1A1LMNAHSD17B10
SCHEMBL28994092 0.86 TDP1 (0.39) TDP1ALOX15ALDH1A1LMNAHSD17B10
SCHEMBL128407 0.86 TDP1 (0.39) TDP1ALOX15ALDH1A1LMNAHSD17B10
SCHEMBL9808875 0.85 TDP1 (0.36) TDP1ALOX15ALDH1A1LMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12638772-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2026-05-26 — — US disclosed
US-20250362610-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2025-11-27 — — US disclosed
US-12386262-B2 Resist underlayer film-forming composition using carbon-oxygen double bond NISSAN CHEMICAL CORPORATION (JP) 2025-08-12 — — US disclosed
US-12313972-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2025-05-27 — — US disclosed
CN-112166379-B Composition for forming resist underlayer film using cyclic carbonyl compound 日产化学株式会社 2025-04-01 — — CN disclosed
US-20250085634-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2025-03-13 — — US disclosed
CN-119585676-A Composition for forming resist underlayer film 日产化学株式会社 2025-03-07 — — CN disclosed
US-20240427238-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2024-12-26 — — US disclosed
US-12072630-B2 Resist underlayer film-forming composition including cyclic carbonyl compound NISSAN CHEMICAL CORPORATION (JP) 2024-08-27 — — US disclosed
CN-112236720-B Composition for forming resist underlayer film using carbon-oxygen double bond 日产化学株式会社 2024-08-16 — — CN disclosed
WO-2022030469-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM 日産化学株式会社 2022-02-10 — — WO disclosed
WO-2022030468-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM 日産化学株式会社 2022-02-10 — — WO disclosed
WO-2021256527-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION USING DIARYLMETHANE DERIVATIVE 日産化学株式会社 2021-12-23 — — WO disclosed
US-20210124268-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING CYCLIC CARBONYL COMPOUND NISSAN CHEMICAL CORPORATION (JP) 2021-04-29 — — US disclosed
US-20210116814-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION USING CARBON-OXYGEN DOUBLE BOND NISSAN CHEMICAL CORPORATION (JP) 2021-04-22 — — US disclosed
WO-2021070775-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM 日産化学株式会社 2021-04-15 — — WO disclosed
WO-2021015181-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION 日産化学株式会社 2021-01-28 — — WO disclosed
CN-112236720-A Composition for forming resist underlayer film using carbon-oxygen double bond 日产化学株式会社 2021-01-15 — — CN disclosed
CN-112166379-A Resist underlayer film forming composition using cyclic carbonyl compound 日产化学株式会社 2021-01-01 — — CN disclosed
WO-2020235427-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION 日産化学株式会社 (JP) 2020-11-26 — — WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12638772-B2 Resist underlayer film-forming composition RFC2, RFC1, RFC4 TDP1 1819/4885ALOX15 1164/4885ALDH1A1 2183/4885
US-12313972-B2 Resist underlayer film-forming composition C5, SLC11A2, MYB TDP1 2186/4885ALOX15 2913/4885ALDH1A1 4339/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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