SCHEMBL4577809

SCHEMBL4577809

C=CC(CCc1ccccc1)OC(=O)c1ccc(O)c(Cl)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 4/20 0.41
CA1 P00915 3/20 0.41
HSD17B2 P37059 2/20 0.41
ADCYAP1R1 P41586 2/20 0.40
L3MBTL1 Q9Y468 1/20 0.37
DPP4 P27487 1/20 0.36
GCGR P47871 1/20 0.36
LNPEP Q9UIQ6 2/20 0.36
ERAP2 Q6P179 1/20 0.36
HSP90AA1 P07900 1/20 0.36
HSP90AB1 P08238 1/20 0.36
PTPN1 P18031 1/20 0.36
ESR1 P03372 1/20 0.36
ESR2 Q92731 1/20 0.36
PPARG P37231 1/20 0.36
PPARA Q07869 1/20 0.36
KMT2A Q03164 2/20 0.35
CA12 O43570 1/20 0.35
CA7 P43166 1/20 0.35
CA9 Q16790 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4578730 0.88 ADCYAP1R1 (0.41) CA2CA1HSD17B2ADCYAP1R1GCGR
SCHEMBL21647766 0.82 TSHR (0.45) DPP4ESR1ESR2KMT2AMEN1
SCHEMBL8185137 0.79 CA2 (0.43) CA2CA1HSD17B2L3MBTL1KMT2A
SCHEMBL9556217 0.74 UTS2R (0.43) CA2CA1ADCYAP1R1GCGRHSP90AA1
SCHEMBL4577811 0.72 ESR1 (0.40) CA2CA1ADCYAP1R1L3MBTL1GCGR
SCHEMBL28525562 0.72 TSHR (0.45) KMT2AMEN1HTTSMN1; SMN2
SCHEMBL10730740 0.72 LMNA (0.64) ADCYAP1R1HSP90AA1ESR1ESR2KMT2A
SCHEMBL9556178 0.71 PTPN1 (0.43) CA2CA1ADCYAP1R1GCGRHSP90AA1
SCHEMBL6284483 0.70 MDM2 (0.41) L3MBTL1PPARGPPARAKMT2A
SCHEMBL27858938 0.70 SMN1; SMN2 (0.40) KMT2AMEN1HTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1298490-B1 Photopolymerizable composition and recording material FUJIFILM CORP (JP) 2008-08-13 EP disclosed
US-7399569-B2 Method for producing microcapsules, microcapsules, recording material, and heat-sensitive recording material FUJIFILM CORPORATION (JP) 2008-07-15 US disclosed
US-20070047038-A1 Hologram recording method, hologram recording material, optical recording medium FUJI PHOTO FILM CO., LTD. 2007-03-01 US disclosed
US-20070048666-A1 Two-photon recording method, two-photon absorption recording material, two-photon absorption recording-reproduction method and optical recoding medium FUJI PHOTO FILM CO., LTD. 2007-03-01 US disclosed
EP-1254780-B1 Recording material FUJI PHOTO FILM CO LTD (JP) 2007-01-03 EP disclosed
US-20050187102-A1 Method for producing microcapsules, microcapsules, recording material, and heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2005-08-25 US disclosed
US-20050158548-A1 Microcapsule, manufacturing method thereof and recording material FUJI PHOTO FILM CO., LTD. 2005-07-21 US disclosed
US-6919159-B2 Photopolymerizable composition and recording material using the same FUJI PHOTO FILM CO., LTD. (JP) 2005-07-19 US disclosed
US-6890879-B2 Recording material and image forming apparatus FUJI PHOTO FILM CO., LTD. (JP) 2005-05-10 US disclosed
US-6846605-B2 Photopolymerizable composition and recording material using same FUJI PHOTO FILM CO., LTD. (JP) 2005-01-25 US disclosed
US-20030224294-A1 Photopolymerizable composition and recording material using same FUJIFILM CORPORATION (JP) 2003-12-04 US disclosed
US-20030129521-A1 Photopolymerizable composition and recording material FUJI PHOTO FILM CO., LTD. 2003-07-10 US disclosed
US-20030129523-A1 Photopolymerizable composition and recording material using the same FUJIFILM CORPORATION (JP) 2003-07-10 US disclosed
EP-1298490-A2 Photopolymerizable composition and recording material Fuji Photo Film Co., Ltd. (JP) 2003-04-02 EP disclosed
US-20020182530-A1 Polymerizable compound having an ethylenic unsaturated bond, a methine dye, and a radical generator that interacts with the dye to generate a radical FUJI PHOTO FILM CO., LTD. 2002-12-05 US disclosed
US-20020183202-A1 Recording material and image forming method FUJI PHOTO FILM CO., LTD. 2002-12-05 US disclosed
US-20020168494-A1 Photopolymerizable composition and photosensitive thermal recording material FUJI PHOTO FILM CO., LTD. 2002-11-14 US disclosed
EP-1254780-A2 Recording material and image forming method Fuji Photo Film Co., Ltd. (JP) 2002-11-06 EP disclosed
US-20020142244-A1 Photopolymerizable composition and recording material FUJI PHOTO FILM CO., LTD. 2002-10-03 US disclosed
US-20020051926-A1 Cyanine-based organic dyes, photopolymerizable compositions, and recording materials FUJI PHOTO FILM CO., LTD. (JP) 2002-05-02 US disclosed