SCHEMBL4585369

SCHEMBL4585369

O=[N+]([O-])c1cccc(-c2c[nH]nn2)c1

nearest known ligand 0.56

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 1/20 0.56
MAPT P10636 6/20 0.52
KEAP1 Q14145 4/20 0.51
NFE2L2 Q16236 4/20 0.51
SMN1; SMN2 Q16637 3/20 0.51
NPC1 O15118 3/20 0.50
RAB9A P51151 3/20 0.50
ALDH1A1 P00352 3/20 0.50
LMNA P02545 2/20 0.48
TSHR P16473 1/20 0.48
MGAM O43451 1/20 0.48
GAA P10253 1/20 0.48
SI P14410 1/20 0.48
PKM P14618 1/20 0.48
MGAM2 Q2M2H8 1/20 0.48
THRB P10828 1/20 0.47
TDP1 Q9NUW8 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27919947 0.83 CYP19A1 (0.52) IDO1MAPTSMN1; SMN2NPC1RAB9A
SCHEMBL4006032 0.80 XDH (0.51) MAPTNPC1RAB9AALDH1A1LMNA
SCHEMBL1646236 0.79 GP6 (0.37) IDO1RAB9AALDH1A1
SCHEMBL27088378 0.77 CYP19A1 (0.40) IDO1MAPTKEAP1NFE2L2SMN1; SMN2
SCHEMBL29979970 0.77 CYP19A1 (0.40) IDO1MAPTKEAP1NFE2L2SMN1; SMN2
SCHEMBL30722372 0.77 PGR (0.44) IDO1MAPTNPC1RAB9AALDH1A1
SCHEMBL27088347 0.77 PGR (0.44) IDO1MAPTNPC1RAB9AALDH1A1
SCHEMBL1015607 0.76 IDO1 (0.61) IDO1MAPTSMN1; SMN2NPC1RAB9A
SCHEMBL1852084 0.76 IDO1 (0.61) IDO1MAPTKEAP1NFE2L2SMN1; SMN2
SCHEMBL27928747 0.76 CYP3A4 (0.41) MAPTSMN1; SMN2NPC1RAB9AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-8022106-A None JP disclosed
US-20080096044-A1 Plating Method, Electrically Conductive Film And Light-Transmitting Electromagnetic Wave Shielding Film FUJIFILM CORPORATION (JP) 2008-04-24 US disclosed
WO-2006129886-A1 PLATING METHOD, ELECTRICALLY CONDUCTIVE FILM AND LIGHT-TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM FUJIFILM CORPORATION (JP) 2006-12-07 WO disclosed
US-6818374-B2 SENSITIVITY, HIGH PROCESSING STABILITY AND HIGH CONTRAST IMAGES FUJI PHOTO FILM CO., LTD. (JP) 2004-11-16 US disclosed
US-20030235792-A1 Silver halide photographic light-sensitive materials and method for development of the same FUJIFILM CORPORATION (JP) 2003-12-25 US disclosed
US-6593074-B2 Comprising at least one dye or sensitizing dye having at least one organic counter ion; merocyanine dyes with organic ammonium counter ions; quality, sensitivity FUJI PHOTO FILM CO., LTD. (JP) 2003-07-15 US disclosed
US-20020018974-A1 Silver halide photographic emulsion, producing method of the same, and silver halide photographic material containing the same FUJIFILM CORPORATION (JP) 2002-02-14 US disclosed
US-5834176-A Silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1998-11-10 US disclosed
EP-0752614-A2 Silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1997-01-08 EP disclosed
JP-H0822106-A IMPROVED SOLID PROCESSING AGENT FOR SILVER HALIDE PHOTOGRAPHIC SENSITIVE MATERIAL FUJI PHOTO FILM CO LTD 1996-01-23 JP disclosed
EP-0330043-A2 Method for processing silver halide color photographic material FUJI PHOTO FILM CO., LTD. (JP) 1989-08-30 EP disclosed
EP-0295583-A2 Silver halide color photographic material FUJI PHOTO FILM CO., LTD. (JP) 1988-12-21 EP disclosed
EP-0246624-A2 Method of forming a color image FUJI PHOTO FILM CO., LTD. (JP) 1987-11-25 EP disclosed