Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Propylene Glycol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylene Glycol SCHEMBL2590009 | 1.00 | TDP1 (0.83) | — | |
| Propylene Glycol SCHEMBL15463578 | 1.00 | TDP1 (0.83) | — | |
| Propylene Glycol SCHEMBL83155 | 1.00 | — | — | |
| Propylene Glycol SCHEMBL28149710 | 0.96 | — | — | |
| Propylene Glycol SCHEMBL6131091 | 0.96 | — | — | |
| Propylene Glycol SCHEMBL23928058 | 0.93 | TDP1 (0.71) | — | |
| Propylene Glycol SCHEMBL8851421 | 0.93 | TDP1 (0.71) | — | |
| Propylene Glycol SCHEMBL8851046 | 0.93 | TDP1 (0.71) | — | |
| Propylene Glycol SCHEMBL3359837 | 0.93 | TDP1 (0.71) | — | |
| Propylene Glycol SCHEMBL5483468 | 0.93 | TDP1 (0.71) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10294350-B2 | Use of tetrahydrobenzoxazines as stabilisers | BASF SE (DE) | 2019-05-21 | — | — | US | claimed |
| US-20130200038-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES | BASF SE (DE) | 2013-08-08 | — | — | US | claimed |
| EP-2614121-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES | BASF SE (DE) | 2013-07-17 | — | — | EP | claimed |
| WO-2012032461-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES | BASF SE (DE) | 2012-03-15 | — | — | WO | claimed |
| EP-0059594-A1 | Method of recovering polyether polyols from polyurethane | FORD MOTOR COMPANY LIMITED (GB) | 1982-09-08 | — | — | EP | claimed |
| US-4336406-A | Polyol extraction by high boiling alkanes | FORD MOTOR COMPANY (US) | 1982-06-22 | — | — | US | claimed |
| US-9891520-B2 | Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning | BASF SE (DE) | 2018-02-13 | — | — | US | disclosed |
| US-9524874-B2 | Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films | BASF SE (DE) | 2016-12-20 | — | — | US | disclosed |
| US-9496146-B2 | Method for forming through-base wafer vias | BASF SE (DE) | 2016-11-15 | — | — | US | disclosed |
| CN-103309188-B | Method for producing toner and toner containing the spacer particle processed through charge control agent | 施乐公司 | 2016-08-10 | — | — | CN | disclosed |
| CN-102681375-B | Method for producing toner and toner and preparation method | 施乐公司 | 2016-08-10 | — | — | CN | disclosed |
| EP-3033408-A1 | THE USE OF SURFACTANTS HAVING AT LEAST THREE SHORT-CHAIN PERFLUORINATED GROUPS IN FORMULATIONS FOR PHOTO MASK CLEANING | BASF SE (DE) | 2016-06-22 | — | — | EP | disclosed |
| US-20160161846-A1 | THE USE OF SURFACTANTS HAVING AT LEAST THREE SHORT-CHAIN PERFLUORINATED GROUPS IN FORMULATIONS FOR PHOTO MASK CLEANING | BASF SE (DE) | 2016-06-09 | — | — | US | disclosed |
| EP-1599522-A2 | THERMOPLASTIC POLYURETHANES | Noveon IP Holdings Corp. (US) | 2005-11-30 | — | — | EP | disclosed |
| US-6884841-B2 | Low monomer containing laminating resin compositions | REICHHOLD, INC. (US) | 2005-04-26 | — | — | US | disclosed |
| US-20040198944-A1 | Thermoplastic polyurethanes | LUBRIZOL ADVANCED MATERIALS, INC. | 2004-10-07 | — | — | US | disclosed |
| WO-2004078816-A2 | THERMOPLASTIC POLYURETHANES | NOVEON IP HOLDINGS CORP. (US) | 2004-09-16 | — | — | WO | disclosed |
| US-20040170850-A1 | Low monomer containing laminating resin compositions | CANTOR FITZGERALD SECURITIES, AS COLLATERAL AGENT | 2004-09-02 | — | — | US | disclosed |
| US-6468662-B1 | UNSATURATED POLYESTER RESIN, A VINYL ESTER RESIN, A POLYFUNCTIONAL ACRYLATE, UP TO 15 PERCENT OF A VINYL MONOMER; VINYL ESTER RESIN IS REACTION PRODUCT OFEPOXY RESIN AND AN UNSATURATED ACID | REICHHOLD, INC. | 2002-10-22 | — | — | US | disclosed |
| US-4371684-A | Thermoplastic polyurethanes for processing in extruders and/or on calenders | BAYER AKTIENGESELLSCHAFT (DE) | 1983-02-01 | — | — | US | disclosed |