SCHEMBL4591973

SCHEMBL4591973

O=C(O)CS(=O)(=O)c1cc(C(F)(F)F)cc(C(F)(F)F)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.50
CES2 O00748 1/20 0.48
HSD11B1 P28845 1/20 0.47
ACP1 P24666 1/20 0.46
MMP2 P08253 1/20 0.44
MMP7 P09237 1/20 0.44
MMP14 P50281 1/20 0.44
RXRA P19793 3/20 0.44
RXRB P28702 3/20 0.44
RXRG P48443 3/20 0.44
LMNA P02545 1/20 0.44
MAPT P10636 1/20 0.42
RECQL P46063 1/20 0.41
POLB P06746 1/20 0.40
SERPINE1 P05121 1/20 0.39
CNR1 P21554 1/20 0.39
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
CA9 Q16790 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6456959 0.83 RECQL (0.59) L3MBTL1CES2HSD11B1MMP2MMP7
SCHEMBL1464397 0.81 HSD11B1 (0.64) HSD11B1MMP2MMP7MMP14
SCHEMBL13063654 0.76 CES2 (0.45) L3MBTL1CES2ACP1MMP2MAPT
Trifluoroacetic Acid SCHEMBL21646225 0.75 MAOB (0.38) L3MBTL1CES2HSD11B1ACP1LMNA
SCHEMBL20283988 0.75 HSD11B1 (0.46) L3MBTL1HSD11B1LMNAMAPTRECQL
SCHEMBL1148973 0.75 CES2 (0.43) L3MBTL1CES2ACP1MMP2LMNA
SCHEMBL21693428 0.74 MAOB (0.42) L3MBTL1CES2HSD11B1ACP1MMP2
Hydrochloric Acid SCHEMBL21646292 0.73 MAOB (0.41) L3MBTL1CES2HSD11B1ACP1MMP2
SCHEMBL8763301 0.72 CES2 (0.41) L3MBTL1CES2ACP1MMP2LMNA
SCHEMBL109565 0.71 CES2 (0.54) L3MBTL1CES2ACP1MMP2RXRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7442485-B2 Lithographic process involving on press development FUJIFILM CORPORATION (JP) 2008-10-28 US disclosed
EP-1484177-B1 Lithographic process involving on press development FUJIFILM CORP (JP) 2007-08-29 EP disclosed
US-20050016402-A1 Lithographic process involving on press development FUJI PHOTO FILM CO., LTD. 2005-01-27 US disclosed
EP-1484177-A2 Lithographic process involving on press development FUJI PHOTO FILM CO., LTD. (JP) 2004-12-08 EP disclosed