SCHEMBL4592498

SCHEMBL4592498

CCC(=O)OC(C)COC.CCOCC(C)O

nearest known ligand 0.41

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.41
TDP1 Q9NUW8 1/20 0.36
MAPT P10636 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4592181 0.91 HSD17B10 (0.41) HSD17B10TDP1MAPT
SCHEMBL143195 0.86 MEN1 (0.35)
SCHEMBL155545 0.85 HSD17B10 (0.42) HSD17B10TDP1MAPT
SCHEMBL104602 0.84 MEN1 (0.34) TDP1
Propionic Acid SCHEMBL7662142 0.80 FFAR3 (0.40)
SCHEMBL27646125 0.79 ALDH1A1 (0.41) HSD17B10TDP1
SCHEMBL223952 0.79 TDP1 (0.36) TDP1
SCHEMBL9937228 0.79 GAA (0.33) TDP1
SCHEMBL28080800 0.78 HSD17B10 (0.53) HSD17B10TDP1MAPT
SCHEMBL7952486 0.78 HSD17B10 (0.58) HSD17B10TDP1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7425404-B2 Chemical amplification resist composition and pattern-forming method using the same FUJIFILM CORPORATION (JP) 2008-09-16 US disclosed
US-7291441-B2 Positive resist composition and pattern forming method utilizing the same FUJIFILM CORPORATION (JP) 2007-11-06 US disclosed
US-20060046190-A1 Positive resist composition and pattern forming method utilizing the same FUJI PHOTO FILM CO., LTD. 2006-03-02 US disclosed
US-20060040208-A1 Chemical amplification resist composition and pattern-forming method using the same FUJI PHOTO FILM CO., LTD. 2006-02-23 US disclosed