Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL104602 | 0.92 | MEN1 (0.34) | TDP1MEN1CYP2C19RECQLKMT2A | |
| SCHEMBL4592498 | 0.91 | HSD17B10 (0.41) | HSD17B10TDP1MAPT | |
| SCHEMBL2700958 | 0.85 | TDP1 (0.39) | TDP1MEN1CYP2C19RECQLKMT2A | |
| SCHEMBL27646125 | 0.83 | ALDH1A1 (0.41) | HSD17B10TDP1MEN1CYP2C19RECQL | |
| SCHEMBL4591928 | 0.83 | TSHR (0.42) | HSD17B10TDP1MAPT | |
| SCHEMBL27646136 | 0.79 | TDP1 (0.36) | TDP1MEN1CYP2C19RECQLKMT2A | |
| SCHEMBL27646088 | 0.79 | L3MBTL1 (0.33) | TDP1MEN1CYP2C19RECQLKMT2A | |
| SCHEMBL9937292 | 0.79 | FAAH (0.31) | TDP1 | |
| Propionic Acid SCHEMBL3291430 | 0.78 | HSD17B10 (0.48) | HSD17B10TDP1MAPT | |
| SCHEMBL7038035 | 0.77 | ALDH1A1 (0.43) | TDP1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7425404-B2 | Chemical amplification resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2008-09-16 | — | — | US | disclosed |
| US-7291441-B2 | Positive resist composition and pattern forming method utilizing the same | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-20060046190-A1 | Positive resist composition and pattern forming method utilizing the same | FUJI PHOTO FILM CO., LTD. | 2006-03-02 | — | — | US | disclosed |
| US-20060040208-A1 | Chemical amplification resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-02-23 | — | — | US | disclosed |