Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | FAAH | O00519 | 4/20 | 0.32 |
| ▸ | CNR1 | P21554 | 1/20 | 0.32 |
| ▸ | CNR2 | P34972 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | MGAM | O43451 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | SI | P14410 | 1/20 | 0.31 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.31 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4592181 | 0.92 | HSD17B10 (0.41) | MEN1CYP2C19RECQLKMT2ATDP1 | |
| SCHEMBL2700958 | 0.92 | TDP1 (0.39) | MEN1CYP2C19RECQLKMT2ATDP1 | |
| SCHEMBL27646125 | 0.90 | ALDH1A1 (0.41) | MEN1CYP2C19RECQLKMT2ATDP1 | |
| SCHEMBL27646136 | 0.86 | TDP1 (0.36) | MEN1CYP2C19RECQLKMT2ALMNA | |
| SCHEMBL9937292 | 0.85 | FAAH (0.31) | FAAHCNR1CNR2LMNATDP1 | |
| SCHEMBL27646088 | 0.85 | L3MBTL1 (0.33) | MEN1CYP2C19RECQLKMT2AFAAH | |
| SCHEMBL4592498 | 0.84 | HSD17B10 (0.41) | TDP1 | |
| SCHEMBL9937646 | 0.83 | FAAH (0.30) | FAAHCNR1CNR2 | |
| SCHEMBL7038035 | 0.83 | ALDH1A1 (0.43) | FAAHCNR1CNR2LMNATDP1 | |
| SCHEMBL445697 | 0.83 | TDP1 (0.50) | MEN1CYP2C19RECQLKMT2AFAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1429 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4720077-A1 | ORGANOMETALLIC TIN OXO CARBOXYLATE CLUSTERS WITH MIXED ORGANIC LIGANDS FOR EUV LITHOGRAPHY | Merck Patent GmbH (DE) | 2026-04-08 | — | — | EP | claimed |
| WO-2025099042-A1 | ORGANOMETALLIC SN OXO CARBOXYLATE CLUSTERS WITH CARBOXYLATE LIGANDS THAT CONTAIN A LINEAR OR CYCLIC ESTER FUNCTIONALITY | MERCK PATENT GMBH (DE) | 2025-05-15 | — | — | WO | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| CN-114556216-B | Positive photosensitive resin composition and display element using same | 株式会社东进世美肯 | 2025-04-25 | — | — | CN | claimed |
| CN-113260922-B | Positive photosensitive resin composition | 株式会社东进世美肯 | 2025-02-25 | — | — | CN | claimed |
| WO-2025032041-A1 | ORGANOMETALLIC CLUSTER CONTAINING SULFUR FOR EUV LITHOGRAPHY BACKGROUND | MERCK PATENT GMBH (DE) | 2025-02-13 | — | — | WO | claimed |
| US-12216403-B2 | Positive photosensitive resin composition and display device using the same | DONJIN SEMICHEM CO., LTD. (KR) | 2025-02-04 | — | — | US | claimed |
| CN-110967927-B | Photosensitive resin composition and display device including the same | 三星显示有限公司 | 2025-01-28 | — | — | CN | claimed |
| WO-2024246119-A1 | ORGANOMETALLIC TIN OXO CARBOXYLATE CLUSTERS WITH MIXED ORGANIC LIGANDS FOR EUV LITHOGRAPHY | MERCK PATENT GMBH (DE) | 2024-12-05 | — | — | WO | claimed |
| EP-4433873-A2 | COMPOSITIONS AND METHODS FOR IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH | Merck Patent GmbH (DE) | 2024-09-25 | — | — | EP | claimed |
| US-8278021-B2 | Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-02 | — | — | US | claimed |
| WO-2012082760-A1 | BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-06-21 | — | — | WO | claimed |
| US-8193307-B2 | Synthesis of photoresist polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-05 | — | — | US | claimed |
| EP-2146246-A1 | Negative resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-01-20 | — | — | EP | claimed |
| US-7635553-B2 | Pattern forming method and resist composition used therefor | FUJIFILM CORPORATION (JP) | 2009-12-22 | — | — | US | claimed |
| US-20090176936-A1 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2009-07-09 | — | — | US | claimed |
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | claimed |
| US-6794108-B1 | COMPOUND CAPABLE OF GENERATING ACID BY ACTINIC RADIATION; POLYMER AND COMPOUND THAT DECOMPOSE TO A SULFONIC ACID; STORAGE STABILITY | FUJI PHOTO FILM CO., LTD. (JP) | 2004-09-21 | — | — | US | claimed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |
| CN-1262317-A | Ether ester type dry cleaning solvent composition | LI JINYAN (CN) | 2000-08-09 | — | — | CN | claimed |